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Surface Passivation for Halide Optoelectronics: Comparing Optimization and Reactivity of Amino-Silanes with Formamidinium

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Huang, Zixu, Akrami, Farhad, Zhang, Junxiang, Barlow, Stephen, Marder, Seth R., Ginger, David S.
Formato:	Preprint
Publicado:	2025
Materias:	Materials Science
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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