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Machine Learning for Polymer Chemical Resistance to Organic Solvents

Fuente: arXiv

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Bibliographic Details
Main Authors:	Kunieda, Shogo, Yambe, Mitsuru, Murashima, Hiromori, Nakamura, Takeru, Shintani, Toshiaki, Kamijima, Hitoshi, Hayashi, Yoshihiro, Hanawa, Yosuke, Yoshida, Ryo
Format:	Preprint
Published:	2025
Subjects:	Soft Condensed Matter Materials Science
Online Access:	Acceder al recurso
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