Dual-Mode Deep Anomaly Detection for Medical Manufacturing: Structural Similarity and Feature Distance

Fuente: arXiv
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Autores principales: Diaz, Julio Zanon, Siogkas, Georgios, Corcoran, Peter
Formato: Preprint
Publicado: 2025
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author Diaz, Julio Zanon
Siogkas, Georgios
Corcoran, Peter
author_facet Diaz, Julio Zanon
Siogkas, Georgios
Corcoran, Peter
contents Automated visual inspection in medical-device manufacturing faces unique challenges, including extremely low defect rates, limited annotated data, hardware restrictions on production lines, and the need for validated, explainable artificial-intelligence systems. This paper presents two attention-guided autoencoder architectures that address these constraints through complementary anomaly-detection strategies. The first employs a multi-scale structural-similarity (4-MS-SSIM) index for inline inspection, enabling interpretable, real-time defect detection on constrained hardware. The second applies a Mahalanobis-distance analysis of randomly reduced latent features for efficient feature-space monitoring and lifecycle verification. Both approaches share a lightweight backbone optimised for high-resolution imagery for typical manufacturing conditions. Evaluations on the Surface Seal Image (SSI) dataset-representing sterile-barrier packaging inspection-demonstrate that the proposed methods outperform reference baselines, including MOCCA, CPCAE, and RAG-PaDiM, under realistic industrial constraints. Cross-domain validation on the MVTec-Zipper benchmark confirms comparable accuracy to state-of-the-art anomaly-detection methods. The dual-mode framework integrates inline anomaly detection and supervisory monitoring, advancing explainable AI architectures toward greater reliability, observability, and lifecycle monitoring in safety-critical manufacturing environments. To facilitate reproducibility, the source code developed for the experiments has been released in the project repository, while the datasets were obtained from publicly available sources.
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id arxiv_https___arxiv_org_abs_2509_05796
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publishDate 2025
record_format arxiv
spellingShingle Dual-Mode Deep Anomaly Detection for Medical Manufacturing: Structural Similarity and Feature Distance
Diaz, Julio Zanon
Siogkas, Georgios
Corcoran, Peter
Computer Vision and Pattern Recognition
Artificial Intelligence
Automated visual inspection in medical-device manufacturing faces unique challenges, including extremely low defect rates, limited annotated data, hardware restrictions on production lines, and the need for validated, explainable artificial-intelligence systems. This paper presents two attention-guided autoencoder architectures that address these constraints through complementary anomaly-detection strategies. The first employs a multi-scale structural-similarity (4-MS-SSIM) index for inline inspection, enabling interpretable, real-time defect detection on constrained hardware. The second applies a Mahalanobis-distance analysis of randomly reduced latent features for efficient feature-space monitoring and lifecycle verification. Both approaches share a lightweight backbone optimised for high-resolution imagery for typical manufacturing conditions. Evaluations on the Surface Seal Image (SSI) dataset-representing sterile-barrier packaging inspection-demonstrate that the proposed methods outperform reference baselines, including MOCCA, CPCAE, and RAG-PaDiM, under realistic industrial constraints. Cross-domain validation on the MVTec-Zipper benchmark confirms comparable accuracy to state-of-the-art anomaly-detection methods. The dual-mode framework integrates inline anomaly detection and supervisory monitoring, advancing explainable AI architectures toward greater reliability, observability, and lifecycle monitoring in safety-critical manufacturing environments. To facilitate reproducibility, the source code developed for the experiments has been released in the project repository, while the datasets were obtained from publicly available sources.
title Dual-Mode Deep Anomaly Detection for Medical Manufacturing: Structural Similarity and Feature Distance
topic Computer Vision and Pattern Recognition
Artificial Intelligence
url https://arxiv.org/abs/2509.05796