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Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Nayak, Sanjay, Andrianov, Nikolai, Gruhn, Thomas, Miranda, Joaquin
Format:	Preprint
Publié:	2025
Sujets:	Materials Science
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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