Saved in:
Bibliographic Details
Main Authors: Ghosh, Jishnu, Parate, Shubham, Basak, Arup, De, Binoy Krishna, Mukhopadhyay, Krishnendu, Agarwal, Abhinav, Gupta, Gopesh Kumar, Nath, Digbijoy, Nukala, Pavan
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2509.09233
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866908532157186048
author Ghosh, Jishnu
Parate, Shubham
Basak, Arup
De, Binoy Krishna
Mukhopadhyay, Krishnendu
Agarwal, Abhinav
Gupta, Gopesh Kumar
Nath, Digbijoy
Nukala, Pavan
author_facet Ghosh, Jishnu
Parate, Shubham
Basak, Arup
De, Binoy Krishna
Mukhopadhyay, Krishnendu
Agarwal, Abhinav
Gupta, Gopesh Kumar
Nath, Digbijoy
Nukala, Pavan
contents Indium selenide (In2Se3), a ferroelectric semiconductor, offers a unique platform for multifunctional nanoelectronics owing to the interplay between polarization dynamics, interlayer sliding, and structural polymorphism. Ferroelectric semiconductor field-effect transistors (FeS-FETs) provide an ideal architecture to harness this coupling. Here, we demonstrate gate-tunable negative differential resistance (NDR) with high peak-to-valley ratios and hysteretic output conductance in In2Se3 FeS-FETs. Combining high-resolution electron microscopy with electrical transport measurements, we attribute the NDR to a field-induced, volatile phase transition from a low-resistance alpha-2H phase to a high-resistance state. Atomic scale ex-situ imaging reveals that in-plane electric fields (Vd) drive interlayer sliding, rotational misalignments that generate Moire patterns, and intralayer shear-together producing stress induced phase transitions. Out-of-plane field however results in robust non-volatile polarization switching. These mechanistic insights highlight both the promise of two dimensional ferroelectric devices for multifunctional nanoelectronics and alternative computing paradigms, and the intrinsic limitations of In2Se3 field-effect transistors for conventional ferroelectric memory applications.
format Preprint
id arxiv_https___arxiv_org_abs_2509_09233
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Field-induced reversible phase transition and negative differential resistance in In2Se3 ferroelectric semiconducting FETs
Ghosh, Jishnu
Parate, Shubham
Basak, Arup
De, Binoy Krishna
Mukhopadhyay, Krishnendu
Agarwal, Abhinav
Gupta, Gopesh Kumar
Nath, Digbijoy
Nukala, Pavan
Materials Science
Indium selenide (In2Se3), a ferroelectric semiconductor, offers a unique platform for multifunctional nanoelectronics owing to the interplay between polarization dynamics, interlayer sliding, and structural polymorphism. Ferroelectric semiconductor field-effect transistors (FeS-FETs) provide an ideal architecture to harness this coupling. Here, we demonstrate gate-tunable negative differential resistance (NDR) with high peak-to-valley ratios and hysteretic output conductance in In2Se3 FeS-FETs. Combining high-resolution electron microscopy with electrical transport measurements, we attribute the NDR to a field-induced, volatile phase transition from a low-resistance alpha-2H phase to a high-resistance state. Atomic scale ex-situ imaging reveals that in-plane electric fields (Vd) drive interlayer sliding, rotational misalignments that generate Moire patterns, and intralayer shear-together producing stress induced phase transitions. Out-of-plane field however results in robust non-volatile polarization switching. These mechanistic insights highlight both the promise of two dimensional ferroelectric devices for multifunctional nanoelectronics and alternative computing paradigms, and the intrinsic limitations of In2Se3 field-effect transistors for conventional ferroelectric memory applications.
title Field-induced reversible phase transition and negative differential resistance in In2Se3 ferroelectric semiconducting FETs
topic Materials Science
url https://arxiv.org/abs/2509.09233