Measuring pulse heating in Si quantum dots with individual two-level fluctuators

Fuente: arXiv
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Main Authors: Ye, Feiyang, Dhami, Lokendra S., Nichol, John M.
Format: Preprint
Published: 2025
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author Ye, Feiyang
Dhami, Lokendra S.
Nichol, John M.
author_facet Ye, Feiyang
Dhami, Lokendra S.
Nichol, John M.
contents To encode quantum information in semiconductor spin qubits, voltage pulses are necessary for initialization, gate operation, and readout. However, these pulses dissipate heat, shifting spin-qubit frequencies and reducing gate fidelities. The cause of this pulse heating in quantum-dot devices is unknown. Here, we measure pulse heating using charged two-level fluctuators (TLFs) in Si/SiGe quantum dots. Specifically, we observe that voltage pulses on nearby gates tend to increase TLF switching rates and occupation biases. The amount of heating depends on the pulse amplitude and frequency, but not on the distance between the pulsed gates and the TLFs. The amount of heating also generally depends on the idling voltage of the pulsed gates, suggesting that electrons accumulated under or near the gates contribute to the heating. We hypothesize that reducing the area of the gates with electrons nearby could mitigate the heating.
format Preprint
id arxiv_https___arxiv_org_abs_2509_10816
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Measuring pulse heating in Si quantum dots with individual two-level fluctuators
Ye, Feiyang
Dhami, Lokendra S.
Nichol, John M.
Mesoscale and Nanoscale Physics
Quantum Physics
To encode quantum information in semiconductor spin qubits, voltage pulses are necessary for initialization, gate operation, and readout. However, these pulses dissipate heat, shifting spin-qubit frequencies and reducing gate fidelities. The cause of this pulse heating in quantum-dot devices is unknown. Here, we measure pulse heating using charged two-level fluctuators (TLFs) in Si/SiGe quantum dots. Specifically, we observe that voltage pulses on nearby gates tend to increase TLF switching rates and occupation biases. The amount of heating depends on the pulse amplitude and frequency, but not on the distance between the pulsed gates and the TLFs. The amount of heating also generally depends on the idling voltage of the pulsed gates, suggesting that electrons accumulated under or near the gates contribute to the heating. We hypothesize that reducing the area of the gates with electrons nearby could mitigate the heating.
title Measuring pulse heating in Si quantum dots with individual two-level fluctuators
topic Mesoscale and Nanoscale Physics
Quantum Physics
url https://arxiv.org/abs/2509.10816