Si-Substituted MAX Phases and In-Situ Formation of Si-coated MXene Composites via Chlorosilane Etching
Fuente:
arXiv
Salvato in:
| Autori principali: | , , , , |
|---|---|
| Natura: | Preprint |
| Pubblicazione: |
2025
|
| Soggetti: | |
| Accesso online: | |
| Tags: |
Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne!!
|
| _version_ | 1866911153894981632 |
|---|---|
| author | Wang, Xudong Fang, Qian Li, Mian Chai, Zhifang Huang, Qing |
| author_facet | Wang, Xudong Fang, Qian Li, Mian Chai, Zhifang Huang, Qing |
| contents | Silicon-based MAX phases are a promising class of layered ceramics with superior thermal and chemical stability. However, their synthesis remains challenging due to inherent thermodynamic instability at high temperatures. Herein, we develop a general top-down strategy to synthesize a broad family of Si-substituted MAX phases (M = Ti, V, Nb, Ta, Cr; X = C, N) by reacting Al-based MAX precursors with SiCl4 vapor. This approach not only circumvents traditional high-temperature limitations but also enables precise A-site defect engineering, resulting in phases with controlled vacancy concentrations (e.g., Nb2Si3/4C and Nb2Si1/2C). Furthermore, we introduce a redox potential-based model that rationalizes the reaction pathway. Using Tin+1AlXn etched with SiCl4 as an example, the process simultaneously forms Cl-terminated MXene (Mn+1XnCl2) and amorphous nano-Si, enabling the one-step synthesis of Si-coated MXene composites. This methodology provides new avenues for designing advanced MAX phases and MXene-based hybrids with tailored functionalities for applications in energy storage and catalysis. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2509_11380 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Si-Substituted MAX Phases and In-Situ Formation of Si-coated MXene Composites via Chlorosilane Etching Wang, Xudong Fang, Qian Li, Mian Chai, Zhifang Huang, Qing Materials Science Silicon-based MAX phases are a promising class of layered ceramics with superior thermal and chemical stability. However, their synthesis remains challenging due to inherent thermodynamic instability at high temperatures. Herein, we develop a general top-down strategy to synthesize a broad family of Si-substituted MAX phases (M = Ti, V, Nb, Ta, Cr; X = C, N) by reacting Al-based MAX precursors with SiCl4 vapor. This approach not only circumvents traditional high-temperature limitations but also enables precise A-site defect engineering, resulting in phases with controlled vacancy concentrations (e.g., Nb2Si3/4C and Nb2Si1/2C). Furthermore, we introduce a redox potential-based model that rationalizes the reaction pathway. Using Tin+1AlXn etched with SiCl4 as an example, the process simultaneously forms Cl-terminated MXene (Mn+1XnCl2) and amorphous nano-Si, enabling the one-step synthesis of Si-coated MXene composites. This methodology provides new avenues for designing advanced MAX phases and MXene-based hybrids with tailored functionalities for applications in energy storage and catalysis. |
| title | Si-Substituted MAX Phases and In-Situ Formation of Si-coated MXene Composites via Chlorosilane Etching |
| topic | Materials Science |
| url | https://arxiv.org/abs/2509.11380 |