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Autori principali: Günkel, Robin, Maßmeyer, Oliver, Stein, Markus, Anhäuser, Sebastian, Bräumer, Kalle, Rodriguez, Rodrigo Sandoval, Anders, Daniel, Dogahe, Badrosadat Ojaghi, Bergmann, Max, Solanki, Milan, Langlotz, Nils Fritjof, Glowatzki, Johannes, Belz, Jürgen, Beyer, Andreas, Witte, Gregor, Chatterjee, Sangam, Volz, Kerstin
Natura: Preprint
Pubblicazione: 2025
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Accesso online:https://arxiv.org/abs/2509.21082
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_version_ 1866909805950533632
author Günkel, Robin
Maßmeyer, Oliver
Stein, Markus
Anhäuser, Sebastian
Bräumer, Kalle
Rodriguez, Rodrigo Sandoval
Anders, Daniel
Dogahe, Badrosadat Ojaghi
Bergmann, Max
Solanki, Milan
Langlotz, Nils Fritjof
Glowatzki, Johannes
Belz, Jürgen
Beyer, Andreas
Witte, Gregor
Chatterjee, Sangam
Volz, Kerstin
author_facet Günkel, Robin
Maßmeyer, Oliver
Stein, Markus
Anhäuser, Sebastian
Bräumer, Kalle
Rodriguez, Rodrigo Sandoval
Anders, Daniel
Dogahe, Badrosadat Ojaghi
Bergmann, Max
Solanki, Milan
Langlotz, Nils Fritjof
Glowatzki, Johannes
Belz, Jürgen
Beyer, Andreas
Witte, Gregor
Chatterjee, Sangam
Volz, Kerstin
contents Two-dimensional (2D) indium selenide (InSe) is a layered semiconductor with high electron mobility and a tunable band gap ranging from 1.25 eV in the bulk to 2.8 eV in the monolayer limit. These properties make these materials strong candidates for future logic and optoelectronic devices. However, growing phase-pure InSe remains challenging due to the complex indium-selenium (In-Se) phase diagram. This complexity and the sensitivity of chemical precursors to growth conditions make it difficult to control which In-Se phase forms during synthesis during, e.g., metal-organic chemical vapor deposition (MOCVD). Despite the challenges, MOCVD is considered the most promising approach for growing InSe, as it enables wafer-scale, uniform, and controllable deposition-key requirements for device integration. In this study, we present a systematic investigation of InSe synthesis via MOCVD on c-plane sapphire substrates at low temperatures, which are highly relevant for various integration schemes. By varying the Se/In precursor ratio and the growth temperature, we create a phase diagram that covers the In-rich, equal stoichiometric, and Se-rich InxSey phases. Raman spectroscopy and atomic force microscopy, supported by energy dispersive X-ray spectroscopy and scanning transmission electron microscopy, confirm conditions, under which the formation of 2D InSe is observed. Atomically-resolved cross-sectional scanning transmission electron microscopy also reveals an epitaxial alignment of the InSe with the sapphire substrate mediated by a specific interface reconstruction. The epitaxial alignment is verified by in-plane X-ray diffraction across large length scales. Samples grown under optimized conditions exhibit a strong optical absorption in the visible range and especially a comparably high electron mobility underlining the potential of the MOCVD-grown material for future applications.
format Preprint
id arxiv_https___arxiv_org_abs_2509_21082
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Low Temperature MOCVD Synthesis of high-mobility 2D InSe
Günkel, Robin
Maßmeyer, Oliver
Stein, Markus
Anhäuser, Sebastian
Bräumer, Kalle
Rodriguez, Rodrigo Sandoval
Anders, Daniel
Dogahe, Badrosadat Ojaghi
Bergmann, Max
Solanki, Milan
Langlotz, Nils Fritjof
Glowatzki, Johannes
Belz, Jürgen
Beyer, Andreas
Witte, Gregor
Chatterjee, Sangam
Volz, Kerstin
Materials Science
Two-dimensional (2D) indium selenide (InSe) is a layered semiconductor with high electron mobility and a tunable band gap ranging from 1.25 eV in the bulk to 2.8 eV in the monolayer limit. These properties make these materials strong candidates for future logic and optoelectronic devices. However, growing phase-pure InSe remains challenging due to the complex indium-selenium (In-Se) phase diagram. This complexity and the sensitivity of chemical precursors to growth conditions make it difficult to control which In-Se phase forms during synthesis during, e.g., metal-organic chemical vapor deposition (MOCVD). Despite the challenges, MOCVD is considered the most promising approach for growing InSe, as it enables wafer-scale, uniform, and controllable deposition-key requirements for device integration. In this study, we present a systematic investigation of InSe synthesis via MOCVD on c-plane sapphire substrates at low temperatures, which are highly relevant for various integration schemes. By varying the Se/In precursor ratio and the growth temperature, we create a phase diagram that covers the In-rich, equal stoichiometric, and Se-rich InxSey phases. Raman spectroscopy and atomic force microscopy, supported by energy dispersive X-ray spectroscopy and scanning transmission electron microscopy, confirm conditions, under which the formation of 2D InSe is observed. Atomically-resolved cross-sectional scanning transmission electron microscopy also reveals an epitaxial alignment of the InSe with the sapphire substrate mediated by a specific interface reconstruction. The epitaxial alignment is verified by in-plane X-ray diffraction across large length scales. Samples grown under optimized conditions exhibit a strong optical absorption in the visible range and especially a comparably high electron mobility underlining the potential of the MOCVD-grown material for future applications.
title Low Temperature MOCVD Synthesis of high-mobility 2D InSe
topic Materials Science
url https://arxiv.org/abs/2509.21082