Gespeichert in:
| Hauptverfasser: | , , , , , , , , , |
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| Format: | Preprint |
| Veröffentlicht: |
2025
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| Schlagworte: | |
| Online-Zugang: | https://arxiv.org/abs/2509.21908 |
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Inhaltsangabe:
- Single-orientation stitching of graphene has emerged as the predominant method for growth of large-area, high-quality graphene films. Particularly noteworthy is graphene grown on single-crystalline Cu(111)/sapphire substrates, which exhibits exceptionally planar oriented stitching due to the atomically smooth substrate, facilitating the formation of continuous, high-quality graphene monolayer. These single-orientation stitches have conventionally been regarded as seamless with negligible defect concentrations. In this report, we present experimental observations regarding graphene grown on single-crystalline Cu(111)/sapphire substrates. Among the graphene flakes with single-orientation, our findings reveal two major merging behaviors: one producing the expected seamless stitching, and another unexpectedly generating structural defects that create nanoscale pathways permitting water permeation. Notably, we identify a unique merging structure--overlapped junction, in which the edge of one graphene flake overlaps and lies atop the edge of another flake, rather than forming a continuous atomic stitch. This discovery challenges the conventional anticipation of single-orientation stitched graphene films as seamless single crystalline film, while offers unique perspective for graphene applications in molecular sieving, selective filtration membranes, and protective coatings.