Identification of formation of amorphous Si phase in SiOxNy films produced by plasma enhanced chemical vapor deposition

Fuente: arXiv

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Bibliographic Details
Main Authors:	Voitovych, M. V., Sarikov, A., Yukhymchuk, V. O., Voitovych, V. V., Semenenko, M. O.
Format:	Preprint
Published:	2025
Subjects:	Materials Science Mesoscale and Nanoscale Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2510.14701