Long Exposure: Accelerating Parameter-Efficient Fine-Tuning for LLMs under Shadowy Sparsity

Fuente: arXiv

Saved in:

Bibliographic Details
Main Authors:	Wang, Tuowei, Li, Kun, Hao, Zixu, Bai, Donglin, Ren, Ju, Zhang, Yaoxue, Cao, Ting, Yang, Mao
Format:	Preprint
Published:	2025
Subjects:	Machine Learning Artificial Intelligence Computation and Language
Online Access:	Acceder al recurso
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet

https://arxiv.org/abs/2510.15964