Strain Engineering of Altermagnetic Symmetry in Epitaxial RuO$_2$ Films

Fuente: arXiv
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Main Authors: Forte, Johnathas D. S., Jeong, Seung Gyo, Santhosh, Anand, Lee, Seungjun, Jalan, Bharat, Low, Tony
Format: Preprint
Published: 2025
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author Forte, Johnathas D. S.
Jeong, Seung Gyo
Santhosh, Anand
Lee, Seungjun
Jalan, Bharat
Low, Tony
author_facet Forte, Johnathas D. S.
Jeong, Seung Gyo
Santhosh, Anand
Lee, Seungjun
Jalan, Bharat
Low, Tony
contents The magnetic ground state of RuO$_2$ has been under intense debate. Using first-principles calculations, we show that compressive strain along [001] direction stabilizes an altermagnetic phase in RuO$_2$ thin films grown on (100) and (110) TiO$_2$ substrates. We further identify that compressive strain enhances the density of states near the Fermi level, resulting in a Fermi surface instability and the emergence of altermagnetism. The magnitude of strain and the associated increase in the density of states can be tuned by varying the film thickness, as systematically confirmed by x-ray diffraction and photoemission spectroscopy measurements. Symmetry analysis further reveals that (100) RuO$_2$ hosts an ideal altermagnetic order, whereas broken symmetry in (110) films leads to an uncompensated ferrimagnetic state. Finally, we discuss the effects of Hubbard $U$ parameters and evaluate the realistic tunneling magnetoresistance of (100) RuO$_2$.
format Preprint
id arxiv_https___arxiv_org_abs_2510_26581
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Strain Engineering of Altermagnetic Symmetry in Epitaxial RuO$_2$ Films
Forte, Johnathas D. S.
Jeong, Seung Gyo
Santhosh, Anand
Lee, Seungjun
Jalan, Bharat
Low, Tony
Materials Science
The magnetic ground state of RuO$_2$ has been under intense debate. Using first-principles calculations, we show that compressive strain along [001] direction stabilizes an altermagnetic phase in RuO$_2$ thin films grown on (100) and (110) TiO$_2$ substrates. We further identify that compressive strain enhances the density of states near the Fermi level, resulting in a Fermi surface instability and the emergence of altermagnetism. The magnitude of strain and the associated increase in the density of states can be tuned by varying the film thickness, as systematically confirmed by x-ray diffraction and photoemission spectroscopy measurements. Symmetry analysis further reveals that (100) RuO$_2$ hosts an ideal altermagnetic order, whereas broken symmetry in (110) films leads to an uncompensated ferrimagnetic state. Finally, we discuss the effects of Hubbard $U$ parameters and evaluate the realistic tunneling magnetoresistance of (100) RuO$_2$.
title Strain Engineering of Altermagnetic Symmetry in Epitaxial RuO$_2$ Films
topic Materials Science
url https://arxiv.org/abs/2510.26581