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Main Authors: Liang, Haidong, Omar, Ganesh Ji, Han, Kun, Bettiol, Andrew A., Huang, Zhen, Ariando, A.
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2511.01206
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author Liang, Haidong
Omar, Ganesh Ji
Han, Kun
Bettiol, Andrew A.
Huang, Zhen
Ariando, A.
author_facet Liang, Haidong
Omar, Ganesh Ji
Han, Kun
Bettiol, Andrew A.
Huang, Zhen
Ariando, A.
contents The interfacial electronic properties of complex oxides are governed by a delicate balance between charge transfer, lattice distortions, and electronic correlations, posing a key challenge for controlled tunability in materials research. Here, we demonstrate that proton implantation serves as a precise tool for modulating interfacial transport in SrTiO3-based heterostructures. By introducing protons into the SrTiO3 substrate beneath an amorphous (La,Sr)(Al,Ta)O3 capping layer, we uncover a competition between disorder and charge doping induced by implantation. At low implantation fluences below 1x1015 protons/cm2 (1E15), charge doping dominates, leading to an increase in carrier density and mobility, analogous to electrostatic gating effect. This enables the emergence of quantum transport oscillations at low temperature. Conversely, at higher fluences (above 1E15), disorder scattering prevails, suppressing carrier mobility and inducing an insulating state. The nonmonotonic evolution of transport with implantation fluence underscores the critical interplay between electronic correlations and disorder, offering a new paradigm for the controlled engineering of interfacial quantum states in SrTiO3-based oxide heterostructures.
format Preprint
id arxiv_https___arxiv_org_abs_2511_01206
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Modulation of Quantum Transport in Complex Oxide Heterostructures with Proton Implantation
Liang, Haidong
Omar, Ganesh Ji
Han, Kun
Bettiol, Andrew A.
Huang, Zhen
Ariando, A.
Materials Science
Strongly Correlated Electrons
The interfacial electronic properties of complex oxides are governed by a delicate balance between charge transfer, lattice distortions, and electronic correlations, posing a key challenge for controlled tunability in materials research. Here, we demonstrate that proton implantation serves as a precise tool for modulating interfacial transport in SrTiO3-based heterostructures. By introducing protons into the SrTiO3 substrate beneath an amorphous (La,Sr)(Al,Ta)O3 capping layer, we uncover a competition between disorder and charge doping induced by implantation. At low implantation fluences below 1x1015 protons/cm2 (1E15), charge doping dominates, leading to an increase in carrier density and mobility, analogous to electrostatic gating effect. This enables the emergence of quantum transport oscillations at low temperature. Conversely, at higher fluences (above 1E15), disorder scattering prevails, suppressing carrier mobility and inducing an insulating state. The nonmonotonic evolution of transport with implantation fluence underscores the critical interplay between electronic correlations and disorder, offering a new paradigm for the controlled engineering of interfacial quantum states in SrTiO3-based oxide heterostructures.
title Modulation of Quantum Transport in Complex Oxide Heterostructures with Proton Implantation
topic Materials Science
Strongly Correlated Electrons
url https://arxiv.org/abs/2511.01206