A Compact Model for Polar Multiple-Channel Field Effect Transistors: A Case Study in III-V Nitride Semiconductors

Fuente: arXiv
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Hauptverfasser: Asteris, Aias, Nguyen, Thai-Son, Xing, Huili Grace, Jena, Debdeep
Format: Preprint
Veröffentlicht: 2025
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author Asteris, Aias
Nguyen, Thai-Son
Xing, Huili Grace
Jena, Debdeep
author_facet Asteris, Aias
Nguyen, Thai-Son
Xing, Huili Grace
Jena, Debdeep
contents A compact analytical model is developed for the mobile charge density of polar multiple channel field effect transistors. Two dimensional electron and hole gases can be potentially induced by spontaneous and piezoelectric polarization in polar heterostructures. Focusing on the active region of devices that employ a multiple quantum-well layout, the total electron and hole populations are estimated from fundamental electrostatic and quantum mechanical principles. Hole gas depletion techniques, revolving around intentional donor doping, are modeled and evaluated, culminating in a generalized closed-form equation for the mobile carrier density across the doping schemes examined. The utility of this model is illustrated for the III-Nitride material system, exploring AlGaN/GaN, AlInN/GaN and AlScN/GaN heterostructures. The compact framework provided herein considerably elucidates and enhances the efficiency of multi-layered transistor design.
format Preprint
id arxiv_https___arxiv_org_abs_2511_01699
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle A Compact Model for Polar Multiple-Channel Field Effect Transistors: A Case Study in III-V Nitride Semiconductors
Asteris, Aias
Nguyen, Thai-Son
Xing, Huili Grace
Jena, Debdeep
Applied Physics
A compact analytical model is developed for the mobile charge density of polar multiple channel field effect transistors. Two dimensional electron and hole gases can be potentially induced by spontaneous and piezoelectric polarization in polar heterostructures. Focusing on the active region of devices that employ a multiple quantum-well layout, the total electron and hole populations are estimated from fundamental electrostatic and quantum mechanical principles. Hole gas depletion techniques, revolving around intentional donor doping, are modeled and evaluated, culminating in a generalized closed-form equation for the mobile carrier density across the doping schemes examined. The utility of this model is illustrated for the III-Nitride material system, exploring AlGaN/GaN, AlInN/GaN and AlScN/GaN heterostructures. The compact framework provided herein considerably elucidates and enhances the efficiency of multi-layered transistor design.
title A Compact Model for Polar Multiple-Channel Field Effect Transistors: A Case Study in III-V Nitride Semiconductors
topic Applied Physics
url https://arxiv.org/abs/2511.01699