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Main Authors: Wang, Yifan, Shahriar, Muhammad Sakib, Soliman, Salma, Vaillancourt, Noah, Fernandes, Lance, Padovani, Andrea, Khan, Asif Islam, Hasan, Md Sakib, Islam, Raisul
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2511.07830
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author Wang, Yifan
Shahriar, Muhammad Sakib
Soliman, Salma
Vaillancourt, Noah
Fernandes, Lance
Padovani, Andrea
Khan, Asif Islam
Hasan, Md Sakib
Islam, Raisul
author_facet Wang, Yifan
Shahriar, Muhammad Sakib
Soliman, Salma
Vaillancourt, Noah
Fernandes, Lance
Padovani, Andrea
Khan, Asif Islam
Hasan, Md Sakib
Islam, Raisul
contents The exponential growth of edge artificial intelligence demands material-focused solutions to overcome energy consumption and latency limitations when processing real-time temporal data. Physical reservoir computing (PRC) offers an energy-efficient paradigm but faces challenges due to limited device scalability and reconfigurability. Additionally, reservoir and readout layers require memory of different timescales, short-term and long-term respectively - a material challenge hindering CMOS-compatible implementations. This work demonstrates a CMOS-compatible ferroelectric transistor using hafnium-zirconium-oxide (HZO) and silicon, enabling dual-memory operation. This system exhibits non-volatile long-term memory (LTM) from ferroelectric HZO polarization and volatile short-term memory (STM) from engineered non-quasi-static (NQS) channel-charge relaxation driven by gate-source/drain overlap capacitance. Ferroelectric polarization acts as non-volatile programming of volatile dynamics: by modulating threshold voltage, the ferroelectric state deterministically switches the NQS time constant and computational behavior between paired-pulse facilitation (PPF) and depression (PPD). This establishes a generalizable material-design principle applicable to diverse ferroelectric-semiconductor heterostructures, extending beyond silicon to oxide semiconductors and heterogeneously-integrated systems. The device solves second-order nonlinear tasks with 3.69 x 10^-3 normalized error using only 16 reservoir states - ~5x reduction - achieving 20 us response time (~1000x faster) and 1.5 x 10^-7 J energy consumption, providing an immediately manufacturable pathway for neuromorphic hardware and energy-efficient edge intelligence.
format Preprint
id arxiv_https___arxiv_org_abs_2511_07830
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle A Dual-Memory Ferroelectric Transistor Emulating Synaptic Metaplasticity for High-Speed Reservoir Computing
Wang, Yifan
Shahriar, Muhammad Sakib
Soliman, Salma
Vaillancourt, Noah
Fernandes, Lance
Padovani, Andrea
Khan, Asif Islam
Hasan, Md Sakib
Islam, Raisul
Other Condensed Matter
Systems and Control
The exponential growth of edge artificial intelligence demands material-focused solutions to overcome energy consumption and latency limitations when processing real-time temporal data. Physical reservoir computing (PRC) offers an energy-efficient paradigm but faces challenges due to limited device scalability and reconfigurability. Additionally, reservoir and readout layers require memory of different timescales, short-term and long-term respectively - a material challenge hindering CMOS-compatible implementations. This work demonstrates a CMOS-compatible ferroelectric transistor using hafnium-zirconium-oxide (HZO) and silicon, enabling dual-memory operation. This system exhibits non-volatile long-term memory (LTM) from ferroelectric HZO polarization and volatile short-term memory (STM) from engineered non-quasi-static (NQS) channel-charge relaxation driven by gate-source/drain overlap capacitance. Ferroelectric polarization acts as non-volatile programming of volatile dynamics: by modulating threshold voltage, the ferroelectric state deterministically switches the NQS time constant and computational behavior between paired-pulse facilitation (PPF) and depression (PPD). This establishes a generalizable material-design principle applicable to diverse ferroelectric-semiconductor heterostructures, extending beyond silicon to oxide semiconductors and heterogeneously-integrated systems. The device solves second-order nonlinear tasks with 3.69 x 10^-3 normalized error using only 16 reservoir states - ~5x reduction - achieving 20 us response time (~1000x faster) and 1.5 x 10^-7 J energy consumption, providing an immediately manufacturable pathway for neuromorphic hardware and energy-efficient edge intelligence.
title A Dual-Memory Ferroelectric Transistor Emulating Synaptic Metaplasticity for High-Speed Reservoir Computing
topic Other Condensed Matter
Systems and Control
url https://arxiv.org/abs/2511.07830