STEM EBIC as a Quantitative Probe of Semiconductor Devices

Fuente: arXiv
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Main Authors: Schneider, Sebastian, Beckert, Sebastian, Hammer, René, König, Markus, Moldovan, Grigore, Pohl, Darius
Format: Preprint
Published: 2025
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author Schneider, Sebastian
Beckert, Sebastian
Hammer, René
König, Markus
Moldovan, Grigore
Pohl, Darius
author_facet Schneider, Sebastian
Beckert, Sebastian
Hammer, René
König, Markus
Moldovan, Grigore
Pohl, Darius
contents Electron beam-induced current (EBIC) imaging in the scanning transmission electron microscope (STEM), STEM-EBIC, provides direct access to carrier transport at the nanoscale. While well established in bulk SEM geometries, its application to thin TEM lamellae remains largely unexplored. Here, we present a systematic STEM-EBIC study of silicon photodiode lamellae prepared by gallium and xenon focused ion beam (FIB) milling. We directly visualize the p-n junctions in thin cross sections and extract effective diffusion lengths for electrons and holes as a function of local thickness. The values are orders of magnitude smaller than those obtained by SEM-EBIC on bulk silicon, reflecting pronounced surface recombination and FIB-induced surface modifications. Current-voltage measurements further reveal severe deviations from the expected diode-like behavior, which we attribute to ohmic metal-semiconductor contacts in the emasurement setup. Our analysis establishes STEM-EBIC as a quantitative probe of carrier transport in nanoscale devices.
format Preprint
id arxiv_https___arxiv_org_abs_2511_11528
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle STEM EBIC as a Quantitative Probe of Semiconductor Devices
Schneider, Sebastian
Beckert, Sebastian
Hammer, René
König, Markus
Moldovan, Grigore
Pohl, Darius
Mesoscale and Nanoscale Physics
Materials Science
Electron beam-induced current (EBIC) imaging in the scanning transmission electron microscope (STEM), STEM-EBIC, provides direct access to carrier transport at the nanoscale. While well established in bulk SEM geometries, its application to thin TEM lamellae remains largely unexplored. Here, we present a systematic STEM-EBIC study of silicon photodiode lamellae prepared by gallium and xenon focused ion beam (FIB) milling. We directly visualize the p-n junctions in thin cross sections and extract effective diffusion lengths for electrons and holes as a function of local thickness. The values are orders of magnitude smaller than those obtained by SEM-EBIC on bulk silicon, reflecting pronounced surface recombination and FIB-induced surface modifications. Current-voltage measurements further reveal severe deviations from the expected diode-like behavior, which we attribute to ohmic metal-semiconductor contacts in the emasurement setup. Our analysis establishes STEM-EBIC as a quantitative probe of carrier transport in nanoscale devices.
title STEM EBIC as a Quantitative Probe of Semiconductor Devices
topic Mesoscale and Nanoscale Physics
Materials Science
url https://arxiv.org/abs/2511.11528