Effect of substrate miscut angle on critical thickness, structural and electronic properties of MBE-grown NbN films on c-plane sapphire

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Auteurs principaux: Ithepalli, Anand, Vashishtha, Saumya, Pieczulewski, Naomi, Liu, Qiao, Rajapurohita, Amit Rohan, Barone, Matthew, Schlom, Darrell, Muller, David A., Xing, Huili Grace, Jena, Debdeep
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Publié: 2025
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author Ithepalli, Anand
Vashishtha, Saumya
Pieczulewski, Naomi
Liu, Qiao
Rajapurohita, Amit Rohan
Barone, Matthew
Schlom, Darrell
Muller, David A.
Xing, Huili Grace
Jena, Debdeep
author_facet Ithepalli, Anand
Vashishtha, Saumya
Pieczulewski, Naomi
Liu, Qiao
Rajapurohita, Amit Rohan
Barone, Matthew
Schlom, Darrell
Muller, David A.
Xing, Huili Grace
Jena, Debdeep
contents We report the structural and electronic properties of niobium nitride (NbN) thin films grown by molecular beam epitaxy on c-plane sapphire with miscut angles of $0.5^\text{o}$, $2^\text{o}$, $4^\text{o}$, and $10^\text{o}$ towards m-axis. X-ray diffraction (XRD) scans reveal that the full width at half maximum of the rocking curves around the 1 1 1 reflection of these NbN films decreases with increasing miscut. Starting from 76 arcsecs on $0.5^\text{o}$ miscut, the FWHM reduces to almost 20 arcsecs on $10^\text{o}$ miscut sapphire indicating improved structural quality. Scanning transmission electron microscopy (STEM) images indicate that NbN on c-sapphire has around 10 nm critical thickness, irrespective of the substrate miscut, above which it turns columnar. The improved structural property is correlated with a marginal increment in superconducting transition temperature $T_\text{c}$ from 12.1 K for NbN on $0.5^\text{o}$ miscut sapphire to 12.5 K for NbN on $10^\text{o}$ miscut sapphire.
format Preprint
id arxiv_https___arxiv_org_abs_2511_13917
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Effect of substrate miscut angle on critical thickness, structural and electronic properties of MBE-grown NbN films on c-plane sapphire
Ithepalli, Anand
Vashishtha, Saumya
Pieczulewski, Naomi
Liu, Qiao
Rajapurohita, Amit Rohan
Barone, Matthew
Schlom, Darrell
Muller, David A.
Xing, Huili Grace
Jena, Debdeep
Superconductivity
Materials Science
We report the structural and electronic properties of niobium nitride (NbN) thin films grown by molecular beam epitaxy on c-plane sapphire with miscut angles of $0.5^\text{o}$, $2^\text{o}$, $4^\text{o}$, and $10^\text{o}$ towards m-axis. X-ray diffraction (XRD) scans reveal that the full width at half maximum of the rocking curves around the 1 1 1 reflection of these NbN films decreases with increasing miscut. Starting from 76 arcsecs on $0.5^\text{o}$ miscut, the FWHM reduces to almost 20 arcsecs on $10^\text{o}$ miscut sapphire indicating improved structural quality. Scanning transmission electron microscopy (STEM) images indicate that NbN on c-sapphire has around 10 nm critical thickness, irrespective of the substrate miscut, above which it turns columnar. The improved structural property is correlated with a marginal increment in superconducting transition temperature $T_\text{c}$ from 12.1 K for NbN on $0.5^\text{o}$ miscut sapphire to 12.5 K for NbN on $10^\text{o}$ miscut sapphire.
title Effect of substrate miscut angle on critical thickness, structural and electronic properties of MBE-grown NbN films on c-plane sapphire
topic Superconductivity
Materials Science
url https://arxiv.org/abs/2511.13917