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  • Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films
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Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films

Fuente: arXiv
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Bibliographic Details
Main Authors: Chen, Chao, Liu, Yulu, Lu, Hongyan, Wang, Zihao, Zheng, Bowen, Guo, Qian, Xiao, Jingkuan, Wang, Ping, Xu, Wanting, Han, Yulin, Chen, Mingxuan, Cai, Xiaofan, Huang, Jiabei, Han, Yaqing, Zhang, Di, Du, Renjun, Mayorov, Alexander S., Li, Ziying, Zhang, Shuai, Huang, Yi, Cheng, Tingting, Chen, Zhaolong, Liu, Ronghua, Tang, Nujiang, Ni, Haibo, Wu, Di, Gao, Libo, Xi, Xiaoxiang, Wang, Qianghua, Wang, Lei, Novoselov, Kostya S., Yu, Geliang
Format: Preprint
Published: 2025
Subjects:
Mesoscale and Nanoscale Physics
Online Access:
Acceder al recurso
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