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| Autores principales: | , , , |
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| Formato: | Preprint |
| Publicado: |
2025
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| Materias: | |
| Acceso en línea: | https://arxiv.org/abs/2511.16374 |
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| _version_ | 1866909915520434176 |
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| author | Helaly, Abdelrahman Sakr, Nourhan Madkour, Kareem Torunoglu, Ilhami |
| author_facet | Helaly, Abdelrahman Sakr, Nourhan Madkour, Kareem Torunoglu, Ilhami |
| contents | Multipatterning is an essential decomposition strategy in electronic design automation (EDA) that overcomes lithographic limitations when printing dense circuit layouts. Although heuristic-based backtracking and SAT solvers can address these challenges, they often struggle to simultaneously handle both complex constraints and secondary objectives. In this study, we present a hybrid workflow that casts multipatterning as a variant of a constrained graph coloring problem with the primary objective of minimizing feature violations and a secondary objective of balancing the number of features on each mask. Our pipeline integrates two main components: (1) A GNN-based agent, trained in an unsupervised manner to generate initial color predictions, which are refined by (2) refinement strategies (a GNN-based heuristic and simulated annealing) that together enhance solution quality and balance. Experimental evaluation in both proprietary data sets and publicly available open source layouts demonstrate complete conflict-free decomposition and consistent color balancing. The proposed framework provides a reproducible, data-efficient and deployable baseline for scalable layout decomposition in EDA workflows. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2511_16374 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Unsupervised Graph Neural Network Framework for Balanced Multipatterning in Advanced Electronic Design Automation Layouts Helaly, Abdelrahman Sakr, Nourhan Madkour, Kareem Torunoglu, Ilhami Hardware Architecture Machine Learning Multipatterning is an essential decomposition strategy in electronic design automation (EDA) that overcomes lithographic limitations when printing dense circuit layouts. Although heuristic-based backtracking and SAT solvers can address these challenges, they often struggle to simultaneously handle both complex constraints and secondary objectives. In this study, we present a hybrid workflow that casts multipatterning as a variant of a constrained graph coloring problem with the primary objective of minimizing feature violations and a secondary objective of balancing the number of features on each mask. Our pipeline integrates two main components: (1) A GNN-based agent, trained in an unsupervised manner to generate initial color predictions, which are refined by (2) refinement strategies (a GNN-based heuristic and simulated annealing) that together enhance solution quality and balance. Experimental evaluation in both proprietary data sets and publicly available open source layouts demonstrate complete conflict-free decomposition and consistent color balancing. The proposed framework provides a reproducible, data-efficient and deployable baseline for scalable layout decomposition in EDA workflows. |
| title | Unsupervised Graph Neural Network Framework for Balanced Multipatterning in Advanced Electronic Design Automation Layouts |
| topic | Hardware Architecture Machine Learning |
| url | https://arxiv.org/abs/2511.16374 |