Low-to-mid Al content ($x\sim$ 0-0.56) Al$_x$In$_{1-x}$N layers deposited on Si(100) by radio-frequency sputtering

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Bibliographic Details
Main Authors:	Blasco, R., Valdueza-Felip, S., Montero, D., Sun, M., Olea, J., Naranjo, F. B.
Format:	Preprint
Published:	2025
Subjects:	Materials Science Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2511.17039