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Low-to-mid Al content ($x\sim$ 0-0.56) Al$_x$In$_{1-x}$N layers deposited on Si(100) by radio-frequency sputtering

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Blasco, R., Valdueza-Felip, S., Montero, D., Sun, M., Olea, J., Naranjo, F. B.
Natura:	Preprint
Pubblicazione:	2025
Soggetti:	Materials Science Applied Physics
Accesso online:	Acceder al recurso
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