:: Library Catalog

Image de couverture de livre

Enregistré dans:

Détails bibliographiques
Auteurs principaux:	Mishra, Shivanshu, Li, Ruixue, Seo, Dongjea, Adhikari, Anil, Cooper, Lucas G., Dawley, Rebecca A., Bol, Ageeth A., Koester, Steven J.
Format:	Preprint
Publié:	2025
Sujets:	Materials Science Mesoscale and Nanoscale Physics
Accès en ligne:	https://arxiv.org/abs/2511.18778
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

Documents similaires

Content Addressable Memory Design with Reference Resistor for Improved Search Resolution
par: Narla, Siri, et autres
Publié: (2025)

Delayed 1T to 2H Phase Transition Upon Electrochemical Delithiation of LiMoS2
par: Hong, Yerin, et autres
Publié: (2025)

Chapter Spatial Atomic Layer Deposition
par: Jiménez, Carmen, et autres
Publié: (2021)

C (sp2) =N (sp2) Bond Formation via Acid‐Catalyzed Condensation of Benzil and 2‐Amino‐4‐chlorophenol: Exploring Structure and Biomedical Applications of Schiff Base Metal Complexes
par: Shivanshu Brahmchari, et autres
Publié: (2025)

Synthesis of NbSe2/Bilayer Nb‐Doped WSe2 Heterostructure from Exfoliated WSe2 Flakes
par: Van Tu Vu, et autres
Publié: (2024)

The New Face of Childcare: Libraries, Teen Parents, Homeless Families. A Report from the California Children's Council.
par: Dawley, Emma
Publié: (1988)

Development of an Atomic Layer Deposition System for Deposition of Alumina as a Hydrogen Permeation Barrier
par: Robinson, Zachary R., et autres
Publié: (2025)

SnS 2 Thin Film with In Situ and Controllable Sb Doping via Atomic Layer Deposition for Optoelectronic Applications
par: Dong‐Ho Shin, et autres
Publié: (2024)

18‐2: Efficient Methodology for Increasing Atomic Layer Deposition Throughput by Optimizing Deposition Rate of SiO2 Film
par: Tao Wang, et autres
Publié: (2025)

Effect of La Spatial Uniformity on Ferroelectric Properties of HfO2 Films Deposited by Atomic Layer Deposition Method
par: Juyoung Jeong, et autres
Publié: (2024)

Simulation of Atomic Layer Deposition with a Quantum Computer
par: Plekhanov, Evgeny, et autres
Publié: (2025)

Atomic Layer Deposition of Molybdenum Carbide Thin Films
par: Paloma Ruiz Kärkkäinen, et autres
Publié: (2024)

Ru‐Based Catalysts Deposited by Atomic Layer Deposition for Non‐Alkaline Zn‐Air Batteries
par: Amit Ohayon, et autres
Publié: (2025)

Ultra‐High Mobility Atomically‐Ordered InGaZnO Transistors Through Atomic Layer Deposition
par: Yoon‐Seo Kim, et autres
Publié: (2025)

Facile Hydrothermal Synthesis of Nb‐Doped WS 2 /WO 3 Nanostructures: Insights into Photoluminescence and Electronic Properties
par: Prarbdh Bhatt, et autres
Publié: (2025)

Synthesis of Nb‐Doped‐WS2–NbS2: A Degenerate‐Semiconductor–Metal Heterostructure
par: Van Tu Vu, et autres
Publié: (2024)

Advanced Fabrication of Ultrathin Ruthenium Films Using Synergistic Atomic Layer Deposition and Etching
par: Jeongbin Lee, et autres
Publié: (2025)

Engineering Metastability in Atomic Layer Deposition: Polymorph and Valence Control
par: Jihoon Jeon, et autres
Publié: (2026)

Atomic Layer Deposition in Transistors and Monolithic 3D Integration
par: Yue Liu, et autres
Publié: (2026)

Atomic Layer Deposition Films for Resistive Random‐Access Memories
par: Chunxue Hao, et autres
Publié: (2024)

Effect of Atomic Layer Deposition of Ultra‐Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes
par: Jongsu Seo, et autres
Publié: (2026)

Atomic Layer Deposited Al1−xNixO: Low Contact Resistivity Hole‐Selective Contact for Crystalline Silicon Solar Cells
par: Yang Hong, et autres
Publié: (2024)

Reliability Engineering of High‐Mobility IGZO Transistors via Gate Insulator Heterostructures Grown by Atomic Layer Deposition
par: Yoon‐Seo Kim, et autres
Publié: (2024)

Semiconductor-like Optical Properties Unveiled by Modeling of Short-Period Aluminum Oxide-Copper Multi-Layered Nanocomposites Deposited by Sputtering Atomic Layer Augmented Deposition (SALAD)
par: Tornøe, Søren A., et autres
Publié: (2022)

Optimizing Atomic Layer Deposition Processes with Nanowire‐Assisted TEM Analysis
par: Peter Schweizer, et autres
Publié: (2024)

Enabling P-type Conduction in Bilayer WS2 with NbP Topological Semimetal Contacts
par: Hoang, Lauren, et autres
Publié: (2024)

Temperature‐Dependent Properties of Atomic Layer Deposition‐Grown TiO2 Thin Films
par: Nimarta Kaur Chowdhary, et autres
Publié: (2025)

Different Nucleation Mechanisms during Atomic Layer Deposition of HfS 2 on Cobalt Oxide Surfaces
par: Georg Fickenscher, et autres
Publié: (2024)

Amorphous Doped Indium Tin Oxide Thin‐Films by Atomic Layer Deposition.Insights into Their Structural, Electronic and Device Reliability
par: M. Isabelle Büschges, et autres
Publié: (2024)

Atomic Layer Deposition of Hafnium Oxide Passivating Layers on Silicon: Impact of Precursor Selection
par: Sophie L. Pain, et autres
Publié: (2024)

Robust Alkaline Hydrogen Evolution From Ru‐degenerate Doped WS 2 /WSe 2 p‐n Junction Heterostructure Electrocatalyst
par: Karthi Sekar, et autres
Publié: (2026)

Hydroxide Modified Synthesis of Atomically‐Doped Photoluminescent WS2 Monolayers
par: Yuliang Ouyang, et autres
Publié: (2024)

Distinguishing different stackings in WSe2 bilayers grown Using Chemical Vapor Deposition
par: Mahmoudi, Aymen, et autres
Publié: (2024)

Chemical Vapor Deposition Growth of Vertical Graphene/WSe2 Heterostructures with Interlayer Twists
par: Xiahong Zhou, et autres
Publié: (2024)

4‐3: Silicon‐Oxide Thin Films Deposited by Plasma‐Enhanced Atomic Layer Deposition for High Mobility Oxide TFT
par: Heeyong Lee, et autres
Publié: (2025)

Structure Properties Correlations on Nickel‐Iron Oxide Catalysts Deposited by Atomic Layer Deposition for the Oxygen Evolution Reaction in Alkaline Media
par: Estelle Jozwiak, et autres
Publié: (2024)

MoS2–WS2 Heterostructures with Vertical Nanosheets for Enhanced Photocatalytic Hydrogen Generation through Morphology‐Controlled Chemical Vapor Deposition
par: Dong‐Bum Seo, et autres
Publié: (2025)

Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth
par: Jorge Luis Vazquez‐Arce, et autres
Publié: (2025)

Mechatronic Spatial Atomic Layer Deposition for Closed‐Loop and Customizable Process Control
par: Daniel Penley, et autres
Publié: (2024)

Are There High-Density Deep States in AtomicLayer-Deposited IGZO Thin Film?
par: Zheng, Liankai, et autres
Publié: (2025)