Carrier transport and electrical bandgaps in epitaxial CrN layers

Fuente: arXiv
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Autori principali: Dinh, Duc V., Herfort, Jens, Fiedler, Andreas, Brandt, Oliver
Natura: Preprint
Pubblicazione: 2025
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author Dinh, Duc V.
Herfort, Jens
Fiedler, Andreas
Brandt, Oliver
author_facet Dinh, Duc V.
Herfort, Jens
Fiedler, Andreas
Brandt, Oliver
contents The transport properties and electrical bandgap of nominally undoped ~75-nm-thick CrN layers simultaneously grown on AlN(0001) and AlN(11\bar{2}2) templates using plasma-assisted molecular beam epitaxy are investigated. The layers grown on AlN(0001) and AlN(11\bar{2}2) exhibit (111) and (113) surface orientations, respectively. All layers exhibit antiferromagnetism with a Néel temperature of ~280 K, observed by temperature-dependent magnetic and electrical measurements. Hall-effect measurements demonstrate n-type semiconducting behavior across a wide temperature range from 4 to 920 K. At low temperatures (4 - 260 K), the data show parallel conduction channels from a metallic impurity band and the conduction band. The carrier mobility exhibits a temperature dependence consistent with a nondegenerate semiconductor, governed by ionized-impurity scattering below 400 K and phonon scattering above 400 K. An analysis of the temperature-dependent carrier density between 300 and 920 K yields two activation energies associated with intrinsic conduction: 0.15 eV (with an uncertainty of -0.02/+0.10 eV), which we attribute to the fundamental bandgap, and 0.50 eV (with an uncertainty of -0.05/+0.15 eV) representing a higher energy transition.
format Preprint
id arxiv_https___arxiv_org_abs_2511_20625
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Carrier transport and electrical bandgaps in epitaxial CrN layers
Dinh, Duc V.
Herfort, Jens
Fiedler, Andreas
Brandt, Oliver
Materials Science
The transport properties and electrical bandgap of nominally undoped ~75-nm-thick CrN layers simultaneously grown on AlN(0001) and AlN(11\bar{2}2) templates using plasma-assisted molecular beam epitaxy are investigated. The layers grown on AlN(0001) and AlN(11\bar{2}2) exhibit (111) and (113) surface orientations, respectively. All layers exhibit antiferromagnetism with a Néel temperature of ~280 K, observed by temperature-dependent magnetic and electrical measurements. Hall-effect measurements demonstrate n-type semiconducting behavior across a wide temperature range from 4 to 920 K. At low temperatures (4 - 260 K), the data show parallel conduction channels from a metallic impurity band and the conduction band. The carrier mobility exhibits a temperature dependence consistent with a nondegenerate semiconductor, governed by ionized-impurity scattering below 400 K and phonon scattering above 400 K. An analysis of the temperature-dependent carrier density between 300 and 920 K yields two activation energies associated with intrinsic conduction: 0.15 eV (with an uncertainty of -0.02/+0.10 eV), which we attribute to the fundamental bandgap, and 0.50 eV (with an uncertainty of -0.05/+0.15 eV) representing a higher energy transition.
title Carrier transport and electrical bandgaps in epitaxial CrN layers
topic Materials Science
url https://arxiv.org/abs/2511.20625