Near-Zero Crosstalk and Ultra-Low Loss Waveguide Crossings Enabled by three-dimensional Ta2O5-on-LNOI Integrated Photonic Platform

Fuente: arXiv
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Auteurs principaux: Nan, Boyang, Ren, Yuan, Wu, Rongbo, Song, Lvbin, Liu, Ruixue, Zheng, Yong, Wang, Min, Cheng, Ya
Format: Preprint
Publié: 2025
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author Nan, Boyang
Ren, Yuan
Wu, Rongbo
Song, Lvbin
Liu, Ruixue
Zheng, Yong
Wang, Min
Cheng, Ya
author_facet Nan, Boyang
Ren, Yuan
Wu, Rongbo
Song, Lvbin
Liu, Ruixue
Zheng, Yong
Wang, Min
Cheng, Ya
contents Waveguide crossings represent one of the most critical components in very-large-scale photonic integration (VLSPI). Three-dimensional waveguide crossings, which distribute optical pathways across multiple planes, can achieve near-zero crosstalk and extremely low crossing-induced loss. However, they face an intrinsic trade-off between interlayer crossing performance and coupling efficiency. To address this challenge, we developed a low-cost fabrication method for 3D waveguide crossings by exploiting the edge rounding effect inherent to chemical mechanical polishing (CMP). Using this method, we demonstrate waveguide crossings with average loss below 0.002 dB and crosstalk below -62 dB on Ta2O5-on-LNOI integrated photonic platform. Our method maintains full compatibility with conventional semiconductor manufacturing technology and paves the way for realizing VLSPI on the thin-film lithium niobate platform.
format Preprint
id arxiv_https___arxiv_org_abs_2512_04886
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Near-Zero Crosstalk and Ultra-Low Loss Waveguide Crossings Enabled by three-dimensional Ta2O5-on-LNOI Integrated Photonic Platform
Nan, Boyang
Ren, Yuan
Wu, Rongbo
Song, Lvbin
Liu, Ruixue
Zheng, Yong
Wang, Min
Cheng, Ya
Optics
Waveguide crossings represent one of the most critical components in very-large-scale photonic integration (VLSPI). Three-dimensional waveguide crossings, which distribute optical pathways across multiple planes, can achieve near-zero crosstalk and extremely low crossing-induced loss. However, they face an intrinsic trade-off between interlayer crossing performance and coupling efficiency. To address this challenge, we developed a low-cost fabrication method for 3D waveguide crossings by exploiting the edge rounding effect inherent to chemical mechanical polishing (CMP). Using this method, we demonstrate waveguide crossings with average loss below 0.002 dB and crosstalk below -62 dB on Ta2O5-on-LNOI integrated photonic platform. Our method maintains full compatibility with conventional semiconductor manufacturing technology and paves the way for realizing VLSPI on the thin-film lithium niobate platform.
title Near-Zero Crosstalk and Ultra-Low Loss Waveguide Crossings Enabled by three-dimensional Ta2O5-on-LNOI Integrated Photonic Platform
topic Optics
url https://arxiv.org/abs/2512.04886