Remote epitaxial frustration
Fuente:
arXiv
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| Autores principales: | , , , , , , , , , |
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| Formato: | Preprint |
| Publicado: |
2025
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| Materias: | |
| Acceso en línea: | |
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| _version_ | 1866914185893380096 |
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| author | Jung, Taehwan Hagopian, Nicholas Sirohi, Anshu Campbell, Quinn Dong, Chengye LaDuca, Zachary T. Samanta, Tamalika Robinson, Joshua Voyles, Paul M. Kawasaki, Jason K. |
| author_facet | Jung, Taehwan Hagopian, Nicholas Sirohi, Anshu Campbell, Quinn Dong, Chengye LaDuca, Zachary T. Samanta, Tamalika Robinson, Joshua Voyles, Paul M. Kawasaki, Jason K. |
| contents | Remote epitaxy relaxes the constraints of conventional epitaxy, to enable low defect density, chemically abrupt heterostructures and exfoliation of single crystalline membranes. However, definitive evidence for a true remote mechanism remains elusive because most experiments can be explained by alternative mechanism that are macroscopically indistinguishable from true remote epitaxy. Using GdAuGe films grown on graphene/SiC (0001), we present two signatures that cannot be explained by the leading alternatives to the remote mechanism: (1) a few atomic layer thick disordered interlayer at the GdAuGe/graphene interface and (2) a $30\degree$ rotated epitaxial relationship between the GdAuGe film and the SiC substrate. Density functional theory calculations indicate these signatures arise from remote epitaxial \textit{frustration}, a competition amongst epitaxy to the remotely screened substrate, to graphene, and to the graphene-induced interfacial reconstruction. Tuning the amplitudes and periodicities of these competing potentials provides new opportunities to intentionally disrupt long-range order. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2512_06986 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Remote epitaxial frustration Jung, Taehwan Hagopian, Nicholas Sirohi, Anshu Campbell, Quinn Dong, Chengye LaDuca, Zachary T. Samanta, Tamalika Robinson, Joshua Voyles, Paul M. Kawasaki, Jason K. Materials Science Remote epitaxy relaxes the constraints of conventional epitaxy, to enable low defect density, chemically abrupt heterostructures and exfoliation of single crystalline membranes. However, definitive evidence for a true remote mechanism remains elusive because most experiments can be explained by alternative mechanism that are macroscopically indistinguishable from true remote epitaxy. Using GdAuGe films grown on graphene/SiC (0001), we present two signatures that cannot be explained by the leading alternatives to the remote mechanism: (1) a few atomic layer thick disordered interlayer at the GdAuGe/graphene interface and (2) a $30\degree$ rotated epitaxial relationship between the GdAuGe film and the SiC substrate. Density functional theory calculations indicate these signatures arise from remote epitaxial \textit{frustration}, a competition amongst epitaxy to the remotely screened substrate, to graphene, and to the graphene-induced interfacial reconstruction. Tuning the amplitudes and periodicities of these competing potentials provides new opportunities to intentionally disrupt long-range order. |
| title | Remote epitaxial frustration |
| topic | Materials Science |
| url | https://arxiv.org/abs/2512.06986 |