Dual-wavelength Fourier Ptychographic Topography
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arXiv
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| Autori principali: | , , , , , , , , , |
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| Natura: | Preprint |
| Pubblicazione: |
2025
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| Soggetti: | |
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| _version_ | 1866915664145416192 |
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| author | Shen, Yi Li, Tongyu Wang, Hao Kim, Jinyong Lee, Hojun Kim, Wookrae Park, Jonghyeok Shin, Junho Park, Seungbeam Tian, Lei |
| author_facet | Shen, Yi Li, Tongyu Wang, Hao Kim, Jinyong Lee, Hojun Kim, Wookrae Park, Jonghyeok Shin, Junho Park, Seungbeam Tian, Lei |
| contents | We introduce a dual-wavelength Fourier ptychographic topography (FPT) method that extends the lambda/2 height-range limit of single-wavelength FPT. By reconstructing complex fields at two illumination wavelengths and exploiting their phase difference, the method achieves an effective synthetic wavelength lambda_s and an unambiguous range of lambda_s/2 without reducing lateral resolution. A noise-robust wrapped-number search is used to select per-pixel integer pairs (k1, k2), and a global refinement with circular TV regularization and soft bounds improves stability and preserves height discontinuities. The approach is validated through rigorous scattering-model-based simulations and experiments on structured silicon samples, demonstrating accurate height recovery in regimes where single-wavelength FPT exhibits phase wrapping. We analyze the limits of the FPT forward model and identify aspect ratio (AR) and phase modulation transfer function (ph-MTF) as key predictors of reconstruction fidelity. Simulations and experiments show that increasing AR beyond a practical threshold causes loss of high-frequency phase transfer and destabilizes dual-wavelength unwrapping. Within this AR range, dual-wavelength FPT provides robust, high-resolution topography suitable for semiconductor and industrial metrology. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2512_08883 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Dual-wavelength Fourier Ptychographic Topography Shen, Yi Li, Tongyu Wang, Hao Kim, Jinyong Lee, Hojun Kim, Wookrae Park, Jonghyeok Shin, Junho Park, Seungbeam Tian, Lei Optics We introduce a dual-wavelength Fourier ptychographic topography (FPT) method that extends the lambda/2 height-range limit of single-wavelength FPT. By reconstructing complex fields at two illumination wavelengths and exploiting their phase difference, the method achieves an effective synthetic wavelength lambda_s and an unambiguous range of lambda_s/2 without reducing lateral resolution. A noise-robust wrapped-number search is used to select per-pixel integer pairs (k1, k2), and a global refinement with circular TV regularization and soft bounds improves stability and preserves height discontinuities. The approach is validated through rigorous scattering-model-based simulations and experiments on structured silicon samples, demonstrating accurate height recovery in regimes where single-wavelength FPT exhibits phase wrapping. We analyze the limits of the FPT forward model and identify aspect ratio (AR) and phase modulation transfer function (ph-MTF) as key predictors of reconstruction fidelity. Simulations and experiments show that increasing AR beyond a practical threshold causes loss of high-frequency phase transfer and destabilizes dual-wavelength unwrapping. Within this AR range, dual-wavelength FPT provides robust, high-resolution topography suitable for semiconductor and industrial metrology. |
| title | Dual-wavelength Fourier Ptychographic Topography |
| topic | Optics |
| url | https://arxiv.org/abs/2512.08883 |