Magnetic properties of molecular beam epitaxy-grown ultrathin Cr2Ge2Te6 films down to monolayer limit on Si substrates

Fuente: arXiv
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Autori principali: Ji, Pengfei, Liu, Ruixuan, Zhu, Tianchen, Liang, Jinxuan, Chen, Yang, Tong, Yitian, Bai, Yunhe, Geng, Zuhan, Chen, Fangting, Zang, Yunyi, Hong, Xiyu, Zhang, Jiatong, Yang, Luyi, Xue, Qi-Kun, He, Ke, Feng, Xiao
Natura: Preprint
Pubblicazione: 2025
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author Ji, Pengfei
Liu, Ruixuan
Zhu, Tianchen
Liang, Jinxuan
Chen, Yang
Tong, Yitian
Bai, Yunhe
Geng, Zuhan
Chen, Fangting
Zang, Yunyi
Hong, Xiyu
Zhang, Jiatong
Yang, Luyi
Xue, Qi-Kun
He, Ke
Feng, Xiao
author_facet Ji, Pengfei
Liu, Ruixuan
Zhu, Tianchen
Liang, Jinxuan
Chen, Yang
Tong, Yitian
Bai, Yunhe
Geng, Zuhan
Chen, Fangting
Zang, Yunyi
Hong, Xiyu
Zhang, Jiatong
Yang, Luyi
Xue, Qi-Kun
He, Ke
Feng, Xiao
contents Cr2Ge2Te6, a prototypical van der Waals ferromagnetic semiconductor, have attracted significant interest for its potential applications in high-performance spintronics. However, the magnetic ground state of monolayer Cr2Ge2Te6 remains elusive due to fragile and irregular-shaped thin flake samples with weak magnetic signals. Here, we successfully grow uniform ferromagnetic Cr2Ge2Te6 films down to monolayer by molecular beam epitaxy. By exploiting a self-limiting growth mode, we achieve synthesis of uniform monolayer Cr2Ge2Te6 films across entire millimeter-scale Si substrates. Through a combination of superconducting quantum interference device magnetometry and anomalous Hall effect measurements, we establish that monolayer Cr2Ge2Te6 exhibits intrinsic ferromagnetism with perpendicular magnetic anisotropy below ~10 K, albeit with strong magnetic fluctuations characteristic of its two-dimensional nature. Furthermore, a systematic thickness-dependent study reveals a crossover from this fluctuation-dominated two-dimensional magnetism turns into conventional long-range ferromagnetic order as the film thickness increases. Our work not only definitively establishes the intrinsic ferromagnetic ground state of monolayer Cr2Ge2Te6, but also provides a scalable, silicon-compatible route for preparing the two-dimensional magnet for future spintronic or quantum devices.
format Preprint
id arxiv_https___arxiv_org_abs_2512_09557
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Magnetic properties of molecular beam epitaxy-grown ultrathin Cr2Ge2Te6 films down to monolayer limit on Si substrates
Ji, Pengfei
Liu, Ruixuan
Zhu, Tianchen
Liang, Jinxuan
Chen, Yang
Tong, Yitian
Bai, Yunhe
Geng, Zuhan
Chen, Fangting
Zang, Yunyi
Hong, Xiyu
Zhang, Jiatong
Yang, Luyi
Xue, Qi-Kun
He, Ke
Feng, Xiao
Materials Science
Cr2Ge2Te6, a prototypical van der Waals ferromagnetic semiconductor, have attracted significant interest for its potential applications in high-performance spintronics. However, the magnetic ground state of monolayer Cr2Ge2Te6 remains elusive due to fragile and irregular-shaped thin flake samples with weak magnetic signals. Here, we successfully grow uniform ferromagnetic Cr2Ge2Te6 films down to monolayer by molecular beam epitaxy. By exploiting a self-limiting growth mode, we achieve synthesis of uniform monolayer Cr2Ge2Te6 films across entire millimeter-scale Si substrates. Through a combination of superconducting quantum interference device magnetometry and anomalous Hall effect measurements, we establish that monolayer Cr2Ge2Te6 exhibits intrinsic ferromagnetism with perpendicular magnetic anisotropy below ~10 K, albeit with strong magnetic fluctuations characteristic of its two-dimensional nature. Furthermore, a systematic thickness-dependent study reveals a crossover from this fluctuation-dominated two-dimensional magnetism turns into conventional long-range ferromagnetic order as the film thickness increases. Our work not only definitively establishes the intrinsic ferromagnetic ground state of monolayer Cr2Ge2Te6, but also provides a scalable, silicon-compatible route for preparing the two-dimensional magnet for future spintronic or quantum devices.
title Magnetic properties of molecular beam epitaxy-grown ultrathin Cr2Ge2Te6 films down to monolayer limit on Si substrates
topic Materials Science
url https://arxiv.org/abs/2512.09557