Mechanisms of inductively coupled BCl3-plasma interaction with the GaN surfaceMechanisms of inductively coupled BCl3-plasma interaction with the GaN surface
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| Format: | Preprint |
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2025
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| _version_ | 1866911316872003584 |
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| author | Kobelev, Anton Andrianov, Nikolay Barsukov, Yuri Smirnov, Alexander |
| author_facet | Kobelev, Anton Andrianov, Nikolay Barsukov, Yuri Smirnov, Alexander |
| contents | Consideration is given to inductively coupled BCl3-plasma (ICP) treatment of the GaN surface, which is a promising technique to get the low resistance ohmic contacts in GaN-based transistors. In some cases, BCl3 plasma treatment results in ohmic contact degradation because BClx radicals tend to form a polymer thin film BxCly on the surface. In the present work, the mechanisms of BCl3 plasma interaction with the GaN surface are considered. Threshold ion energies of reactive ion etching for polymer BxCly and semiconductor GaN, respectively, are estimated using numerical plasma modeling. It has been demonstrated that a plasma treatment regime without polymer deposition and reactive etching is possible when an ion energy is in the range ~32-60 eV. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2512_12569 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Mechanisms of inductively coupled BCl3-plasma interaction with the GaN surfaceMechanisms of inductively coupled BCl3-plasma interaction with the GaN surface Kobelev, Anton Andrianov, Nikolay Barsukov, Yuri Smirnov, Alexander Chemical Physics Consideration is given to inductively coupled BCl3-plasma (ICP) treatment of the GaN surface, which is a promising technique to get the low resistance ohmic contacts in GaN-based transistors. In some cases, BCl3 plasma treatment results in ohmic contact degradation because BClx radicals tend to form a polymer thin film BxCly on the surface. In the present work, the mechanisms of BCl3 plasma interaction with the GaN surface are considered. Threshold ion energies of reactive ion etching for polymer BxCly and semiconductor GaN, respectively, are estimated using numerical plasma modeling. It has been demonstrated that a plasma treatment regime without polymer deposition and reactive etching is possible when an ion energy is in the range ~32-60 eV. |
| title | Mechanisms of inductively coupled BCl3-plasma interaction with the GaN surfaceMechanisms of inductively coupled BCl3-plasma interaction with the GaN surface |
| topic | Chemical Physics |
| url | https://arxiv.org/abs/2512.12569 |