Saved in:
Bibliographic Details
Main Authors: Klein, Amelia R., Austin, Hayley J., Murakami, Fumikazu, Ford, Jamie, Tatebayashi, Jun, Tonouchi, Masayoshi, Fujiwara, Yasufumi, Dierolf, Volkmar, Bassett, Lee C., Mitchell, Brandon
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2512.15005
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866915875059138560
author Klein, Amelia R.
Austin, Hayley J.
Murakami, Fumikazu
Ford, Jamie
Tatebayashi, Jun
Tonouchi, Masayoshi
Fujiwara, Yasufumi
Dierolf, Volkmar
Bassett, Lee C.
Mitchell, Brandon
author_facet Klein, Amelia R.
Austin, Hayley J.
Murakami, Fumikazu
Ford, Jamie
Tatebayashi, Jun
Tonouchi, Masayoshi
Fujiwara, Yasufumi
Dierolf, Volkmar
Bassett, Lee C.
Mitchell, Brandon
contents Europium-doped gallium nitride (GaN:Eu) is a promising platform for classical and quantum optoelectronic applications. When grown using organometallic vapor-phase epitaxy, the dominant red emission from Eu exhibits an inhomogeneous photoluminescence (PL) spectrum due to contributions from several non-equivalent incorporation sites that can be distinguished with combined excitation emission spectroscopy. Energy transfer from the GaN bandgap to the majority site is inefficient, limiting the performance of GaN:Eu LEDs and resulting in an inhomogeneous emission spectrum dominated by disproportionate contributions from minority sites. In this work, we use site-selective spectroscopy to characterize the photoluminescence properties of delta-doped structures with alternating doped and undoped layers of varying thicknesses and demonstrate that they selectively enhance emission from the majority site when compared to uniformly-doped samples. Samples with 2-nm and 10-nm doped layers show much greater PL intensity per Eu concentration as well as more efficient energy transfer to the majority site, which are both highly desirable for creating power-efficient LEDs. Meanwhile, a sample with 1-nm doped layers shows emission only from the majority site, resulting in a narrow, homogeneous emission spectrum that is desirable for quantum technologies. This utilization of delta-doping has the potential to be broadly applicable for engineering desirable defect properties in rare-earth doped semiconductors.
format Preprint
id arxiv_https___arxiv_org_abs_2512_15005
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Site-selective enhancement of Eu emission in delta-doped GaN
Klein, Amelia R.
Austin, Hayley J.
Murakami, Fumikazu
Ford, Jamie
Tatebayashi, Jun
Tonouchi, Masayoshi
Fujiwara, Yasufumi
Dierolf, Volkmar
Bassett, Lee C.
Mitchell, Brandon
Materials Science
Optics
Europium-doped gallium nitride (GaN:Eu) is a promising platform for classical and quantum optoelectronic applications. When grown using organometallic vapor-phase epitaxy, the dominant red emission from Eu exhibits an inhomogeneous photoluminescence (PL) spectrum due to contributions from several non-equivalent incorporation sites that can be distinguished with combined excitation emission spectroscopy. Energy transfer from the GaN bandgap to the majority site is inefficient, limiting the performance of GaN:Eu LEDs and resulting in an inhomogeneous emission spectrum dominated by disproportionate contributions from minority sites. In this work, we use site-selective spectroscopy to characterize the photoluminescence properties of delta-doped structures with alternating doped and undoped layers of varying thicknesses and demonstrate that they selectively enhance emission from the majority site when compared to uniformly-doped samples. Samples with 2-nm and 10-nm doped layers show much greater PL intensity per Eu concentration as well as more efficient energy transfer to the majority site, which are both highly desirable for creating power-efficient LEDs. Meanwhile, a sample with 1-nm doped layers shows emission only from the majority site, resulting in a narrow, homogeneous emission spectrum that is desirable for quantum technologies. This utilization of delta-doping has the potential to be broadly applicable for engineering desirable defect properties in rare-earth doped semiconductors.
title Site-selective enhancement of Eu emission in delta-doped GaN
topic Materials Science
Optics
url https://arxiv.org/abs/2512.15005