Vertical NAND in a Ferroelectric-driven Paradigm Shift

Fuente: arXiv
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Auteurs principaux: Kim, Giuk, Choi, Hyojun, Ravindran, Prasanna Venkat, Jung, Moonyoung, Park, Sanghyun, Kim, Kijoon, Lim, Suhwan, Seo, Kwangyou, Kim, Kwangsoo, Kim, Wanki, Ha, Daewon, Shin, Sukjoong, Khan, Asif, Jeon, Sanghun, Ni, Kai
Format: Preprint
Publié: 2025
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author Kim, Giuk
Choi, Hyojun
Ravindran, Prasanna Venkat
Jung, Moonyoung
Park, Sanghyun
Kim, Kijoon
Lim, Suhwan
Seo, Kwangyou
Kim, Kwangsoo
Kim, Wanki
Ha, Daewon
Shin, Sukjoong
Khan, Asif
Jeon, Sanghun
Ni, Kai
author_facet Kim, Giuk
Choi, Hyojun
Ravindran, Prasanna Venkat
Jung, Moonyoung
Park, Sanghyun
Kim, Kijoon
Lim, Suhwan
Seo, Kwangyou
Kim, Kwangsoo
Kim, Wanki
Ha, Daewon
Shin, Sukjoong
Khan, Asif
Jeon, Sanghun
Ni, Kai
contents Over the past decades, the relentless scaling and mass production of flash memory have underpinned the data-centric era. Yet charge-trap-based 3D NAND flash is now constrained by intrinsic physical and architectural limits, including reliability degradation at the device level, high operating power at the array level, and vertical scaling saturation at the system level. These bottlenecks hinder further advances in storage density and energy efficiency required by memory-centric computing. This Perspective outlines how coupling ferroelectric polarization with charge trapping can reconfigure the foundations of flash memory. In these hybrid architectures, polarization offers an energy-efficient pathway for charge modulation through enhanced Fowler-Nordheim tunneling, while trapped charges reinforce polarization-driven states to ensure stability. Such synergistic dynamics enable low-voltage operation and integration beyond one thousand layers without compromising process compatibility. We discuss the material, device, and architectural transitions required to realize this hybrid technology and chart future research directions to overcome the remaining scaling bottlenecks. Hybrid ferroelectric NAND extends conventional flash toward a scalable and energy-efficient platform, marking a paradigm shift for next-generation non-volatile memory.
format Preprint
id arxiv_https___arxiv_org_abs_2512_15988
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Vertical NAND in a Ferroelectric-driven Paradigm Shift
Kim, Giuk
Choi, Hyojun
Ravindran, Prasanna Venkat
Jung, Moonyoung
Park, Sanghyun
Kim, Kijoon
Lim, Suhwan
Seo, Kwangyou
Kim, Kwangsoo
Kim, Wanki
Ha, Daewon
Shin, Sukjoong
Khan, Asif
Jeon, Sanghun
Ni, Kai
Applied Physics
Over the past decades, the relentless scaling and mass production of flash memory have underpinned the data-centric era. Yet charge-trap-based 3D NAND flash is now constrained by intrinsic physical and architectural limits, including reliability degradation at the device level, high operating power at the array level, and vertical scaling saturation at the system level. These bottlenecks hinder further advances in storage density and energy efficiency required by memory-centric computing. This Perspective outlines how coupling ferroelectric polarization with charge trapping can reconfigure the foundations of flash memory. In these hybrid architectures, polarization offers an energy-efficient pathway for charge modulation through enhanced Fowler-Nordheim tunneling, while trapped charges reinforce polarization-driven states to ensure stability. Such synergistic dynamics enable low-voltage operation and integration beyond one thousand layers without compromising process compatibility. We discuss the material, device, and architectural transitions required to realize this hybrid technology and chart future research directions to overcome the remaining scaling bottlenecks. Hybrid ferroelectric NAND extends conventional flash toward a scalable and energy-efficient platform, marking a paradigm shift for next-generation non-volatile memory.
title Vertical NAND in a Ferroelectric-driven Paradigm Shift
topic Applied Physics
url https://arxiv.org/abs/2512.15988