Low-loss frequency-tunable Josephson junction array cavities on Ge/SiGe heterostructures with a tapered etching approach

Fuente: arXiv
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Main Authors: De Palma, Franco, Acinapura, Elena, Jang, Wonjin, Oppliger, Fabian, Krishnan, Radha, Nigro, Arianna, Zardo, Ilaria, Scarlino, Pasquale
Format: Preprint
Published: 2025
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author De Palma, Franco
Acinapura, Elena
Jang, Wonjin
Oppliger, Fabian
Krishnan, Radha
Nigro, Arianna
Zardo, Ilaria
Scarlino, Pasquale
author_facet De Palma, Franco
Acinapura, Elena
Jang, Wonjin
Oppliger, Fabian
Krishnan, Radha
Nigro, Arianna
Zardo, Ilaria
Scarlino, Pasquale
contents Ge/SiGe heterostructures represent a promising platform for hosting various quantum devices such as hole spin qubits and Andreev spin qubits. However, the compatibility of such heterostructures with high-quality-factor microwave superconducting cavities remains a challenge due to defects in the material stack. In this work, we present an approach to enhance the coherence of cavity modes on a reverse-graded Ge/SiGe heterostructure, which consists of etching the full $\sim 1.6~\mathrm{μm}$-thick Ge/SiGe stack down to its starting high-resistivity Si substrate, in order to pattern superconducting cavities directly on it. We engineer the mesa step to be tapered, so that it can be easily climbed by the superconducting cavities to reach the quantum devices potentially hosted in the Ge quantum well. Using this approach, we observe internal quality factors of $Q_\mathrm{i} \approx 10000-20000$ for high-impedance frequency-tunable Josephson junction array resonators, limited by the junctions' fabrication, and $Q_\mathrm{i} \approx 100000$ for $50~\mathrmΩ$ coplanar waveguide Nb lift-off resonators. These $Q_\mathrm{i}$ are preserved despite the overlap with the mesa structure in the climbing region, and are comparable to the ones obtained for identical resonators fabricated on a high-resistivity Si wafer reference. Thereby, this work paves a practical path toward superconductor-semiconductor hybrid devices, immediately applicable to emerging technologies on planar Ge.
format Preprint
id arxiv_https___arxiv_org_abs_2512_17812
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Low-loss frequency-tunable Josephson junction array cavities on Ge/SiGe heterostructures with a tapered etching approach
De Palma, Franco
Acinapura, Elena
Jang, Wonjin
Oppliger, Fabian
Krishnan, Radha
Nigro, Arianna
Zardo, Ilaria
Scarlino, Pasquale
Quantum Physics
Mesoscale and Nanoscale Physics
Ge/SiGe heterostructures represent a promising platform for hosting various quantum devices such as hole spin qubits and Andreev spin qubits. However, the compatibility of such heterostructures with high-quality-factor microwave superconducting cavities remains a challenge due to defects in the material stack. In this work, we present an approach to enhance the coherence of cavity modes on a reverse-graded Ge/SiGe heterostructure, which consists of etching the full $\sim 1.6~\mathrm{μm}$-thick Ge/SiGe stack down to its starting high-resistivity Si substrate, in order to pattern superconducting cavities directly on it. We engineer the mesa step to be tapered, so that it can be easily climbed by the superconducting cavities to reach the quantum devices potentially hosted in the Ge quantum well. Using this approach, we observe internal quality factors of $Q_\mathrm{i} \approx 10000-20000$ for high-impedance frequency-tunable Josephson junction array resonators, limited by the junctions' fabrication, and $Q_\mathrm{i} \approx 100000$ for $50~\mathrmΩ$ coplanar waveguide Nb lift-off resonators. These $Q_\mathrm{i}$ are preserved despite the overlap with the mesa structure in the climbing region, and are comparable to the ones obtained for identical resonators fabricated on a high-resistivity Si wafer reference. Thereby, this work paves a practical path toward superconductor-semiconductor hybrid devices, immediately applicable to emerging technologies on planar Ge.
title Low-loss frequency-tunable Josephson junction array cavities on Ge/SiGe heterostructures with a tapered etching approach
topic Quantum Physics
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2512.17812