Look Closer! An Adversarial Parametric Editing Framework for Hallucination Mitigation in VLMs

Fuente: arXiv

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Bibliographic Details
Main Authors:	Hu, Jiayu, Li, Beibei, Xia, Jiangwei, Qin, Yanjun, Ji, Bing, He, Zhongshi
Format:	Preprint
Published:	2025
Subjects:	Computer Vision and Pattern Recognition Machine Learning
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2512.21999