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Main Authors: Taihi, Ayah Soundous, Pai, David Z.
Format: Preprint
Published: 2026
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Online Access:https://arxiv.org/abs/2601.01994
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author Taihi, Ayah Soundous
Pai, David Z.
author_facet Taihi, Ayah Soundous
Pai, David Z.
contents Semiconducting Barrier Discharges (SeBDs) generate uniform ionization waves in air at atmospheric pressure. In this work, we investigate how externally applied irradiation synchronized with the discharge can mimic photoconductive-type coupling between the plasma and the semiconductor surface. By illuminating the Si-SiO$_2$ interface with nanosecond pulsed irradiation at wavelengths from 532 nm to 1064 nm, and using fast imaging, optical emission spectroscopy, and current-voltage measurements, we demonstrate that the photoexcitation of charge carriers in silicon enhances the plasma emission and increases the reduced electric field, with no detectable change in the electrical energy. The magnitude and thresholds of these responses depend on wavelength. By comparing the SeBD to a MOS photodetector, this behaviour can be explained by the absorption length. This length determines whether carriers are photogenerated inside the depletion region at the SiO$_2$-Si interface, where they are efficiently separated and undergo impact-ionization amplification, or deeper in the silicon bulk where carrier separation is weaker and free-carrier absorption diminishes the quantum efficiency. These results focus on the microscopic processes governing the plasma-semiconductor coupling and demonstrate how the optoelectronic properties of silicon can influence surface ionization waves.
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id arxiv_https___arxiv_org_abs_2601_01994
institution arXiv
publishDate 2026
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spellingShingle Photonic Interactions with Semiconducting Barrier Discharges
Taihi, Ayah Soundous
Pai, David Z.
Plasma Physics
Materials Science
Applied Physics
Semiconducting Barrier Discharges (SeBDs) generate uniform ionization waves in air at atmospheric pressure. In this work, we investigate how externally applied irradiation synchronized with the discharge can mimic photoconductive-type coupling between the plasma and the semiconductor surface. By illuminating the Si-SiO$_2$ interface with nanosecond pulsed irradiation at wavelengths from 532 nm to 1064 nm, and using fast imaging, optical emission spectroscopy, and current-voltage measurements, we demonstrate that the photoexcitation of charge carriers in silicon enhances the plasma emission and increases the reduced electric field, with no detectable change in the electrical energy. The magnitude and thresholds of these responses depend on wavelength. By comparing the SeBD to a MOS photodetector, this behaviour can be explained by the absorption length. This length determines whether carriers are photogenerated inside the depletion region at the SiO$_2$-Si interface, where they are efficiently separated and undergo impact-ionization amplification, or deeper in the silicon bulk where carrier separation is weaker and free-carrier absorption diminishes the quantum efficiency. These results focus on the microscopic processes governing the plasma-semiconductor coupling and demonstrate how the optoelectronic properties of silicon can influence surface ionization waves.
title Photonic Interactions with Semiconducting Barrier Discharges
topic Plasma Physics
Materials Science
Applied Physics
url https://arxiv.org/abs/2601.01994