Transverse Photoresistivity from Photothermal Current Deflection in Metal Films

Fuente: arXiv
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Bibliographic Details
Main Authors: Sakrikar, Piyush, Plisson, Vincent M., Grant, Cameron, Rosenmerkel, Dylan, Natale, Gabriel, Geiwitz, Michael, Ran, Ying, Kempa, Krzysztof, Burch, Kenneth S.
Format: Preprint
Published: 2026
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_version_ 1866918273317076992
author Sakrikar, Piyush
Plisson, Vincent M.
Grant, Cameron
Rosenmerkel, Dylan
Natale, Gabriel
Geiwitz, Michael
Ran, Ying
Kempa, Krzysztof
Burch, Kenneth S.
author_facet Sakrikar, Piyush
Plisson, Vincent M.
Grant, Cameron
Rosenmerkel, Dylan
Natale, Gabriel
Geiwitz, Michael
Ran, Ying
Kempa, Krzysztof
Burch, Kenneth S.
contents Quantum geometry in centrosymmetric systems has motivated the search for photocurrent responses beyond second order. In particular, electric field-induced nonlinear responses may also enable intrinsic polarization-sensitive optical detectors. Despite numerous efforts, clear methods are still needed to remove experimental artifacts, separating intrinsic from extrinsic effects, and disentangling linear responses from their higher-order counterparts. Here, we provide a systematic study of fabrication and measurement techniques to remove external artifacts in photoelectronic responses. This reveals a previously hidden photothermoelectric response in the transverse photoresistivity of symmetric thin films of simple metals. We identify its origin in thermal gradients producing current deflection and determine the device design and measurement parameters to minimize extrinsic effects that arise in photoinduced electronic responses.
format Preprint
id arxiv_https___arxiv_org_abs_2601_02340
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Transverse Photoresistivity from Photothermal Current Deflection in Metal Films
Sakrikar, Piyush
Plisson, Vincent M.
Grant, Cameron
Rosenmerkel, Dylan
Natale, Gabriel
Geiwitz, Michael
Ran, Ying
Kempa, Krzysztof
Burch, Kenneth S.
Materials Science
Quantum geometry in centrosymmetric systems has motivated the search for photocurrent responses beyond second order. In particular, electric field-induced nonlinear responses may also enable intrinsic polarization-sensitive optical detectors. Despite numerous efforts, clear methods are still needed to remove experimental artifacts, separating intrinsic from extrinsic effects, and disentangling linear responses from their higher-order counterparts. Here, we provide a systematic study of fabrication and measurement techniques to remove external artifacts in photoelectronic responses. This reveals a previously hidden photothermoelectric response in the transverse photoresistivity of symmetric thin films of simple metals. We identify its origin in thermal gradients producing current deflection and determine the device design and measurement parameters to minimize extrinsic effects that arise in photoinduced electronic responses.
title Transverse Photoresistivity from Photothermal Current Deflection in Metal Films
topic Materials Science
url https://arxiv.org/abs/2601.02340