Contact resistance and interfacial engineering: Advances in high-performance 2D-TMD based devices

Fuente: arXiv

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Bibliographic Details
Main Authors:	Liu, Xiongfang, Xing, Kaijian, Tang, Chi Sin, Sun, Shuo, Chen, Pan, Qi, Dong-Chen, Breese, Mark B. H., Fuhrer, Michael S., Wee, Andrew T. S., Yin, Xinmao
Format:	Preprint
Published:	2026
Subjects:	Materials Science Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2601.02628