Copertina

Contact resistance and interfacial engineering: Advances in high-performance 2D-TMD based devices

Fuente: arXiv

Salvato in:

Dettagli Bibliografici
Autori principali:	Liu, Xiongfang, Xing, Kaijian, Tang, Chi Sin, Sun, Shuo, Chen, Pan, Qi, Dong-Chen, Breese, Mark B. H., Fuhrer, Michael S., Wee, Andrew T. S., Yin, Xinmao
Natura:	Preprint
Pubblicazione:	2026
Soggetti:	Materials Science Applied Physics
Accesso online:	Acceder al recurso
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