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| Main Authors: | , , , , , , , , , , , , , , , , , |
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| Format: | Preprint |
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2026
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2601.07494 |
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| _version_ | 1866914541440335872 |
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| author | Huang, Chengyuan Ma, Changjian Ha, Mengke Shang, Longbing Chen, Zhenlan Xiao, Qing Qin, Zhiyuan Liu, Danqing Wang, Haoyuan Qiu, Dawei Zhao, Qianyi Guo, Ziliang Liu, Yanling Chen, Dingbang Ye, Chengxuan Li, Zhenhao Duan, Chang-Kui Cheng, Guanglei |
| author_facet | Huang, Chengyuan Ma, Changjian Ha, Mengke Shang, Longbing Chen, Zhenlan Xiao, Qing Qin, Zhiyuan Liu, Danqing Wang, Haoyuan Qiu, Dawei Zhao, Qianyi Guo, Ziliang Liu, Yanling Chen, Dingbang Ye, Chengxuan Li, Zhenhao Duan, Chang-Kui Cheng, Guanglei |
| contents | Reconfigurable oxide nanoelectronics, enabled by conductive atomic force microscope (cAFM) lithography, have established complex oxide interfaces as a promising platform for quantum engineering that harnesses emergent phenomena for advanced functionalities. However, this cAFM nanofabrication process can only occur in the air, with simultaneous device decay described under the "water-cycle" writing mechanism. These restrictions pose ongoing challenges for device optimization in the quantum regime at mK temperatures. Here, we demonstrate a "waterless" cAFM lithography approach that is compatible with vacuum and cryogenic environments. Through oxygen vacancy engineering at the LaAlO$_3$/SrTiO$_3$ interface, we have achieved nonvolatile and reconfigurable cAFM control of nanoscale interfacial polaron-electron liquid transition at mK temperatures with an ultrafine line resolution of 0.85 nm. Supported by first-principles calculations and drift-diffusion modeling, we show that tip-controlled oxygen vacancy electromigration plays a key role. This advancement bridges reconfigurable device fabrication and concurrent characterization in situ at mK temperatures, and establishes a versatile Hubbard toolbox for engineering programmable quantum phases in correlated oxides. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2601_07494 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Reconfigurable Oxide Nanoelectronics by Tip-induced Electron Delocalization Huang, Chengyuan Ma, Changjian Ha, Mengke Shang, Longbing Chen, Zhenlan Xiao, Qing Qin, Zhiyuan Liu, Danqing Wang, Haoyuan Qiu, Dawei Zhao, Qianyi Guo, Ziliang Liu, Yanling Chen, Dingbang Ye, Chengxuan Li, Zhenhao Duan, Chang-Kui Cheng, Guanglei Mesoscale and Nanoscale Physics Materials Science Strongly Correlated Electrons Reconfigurable oxide nanoelectronics, enabled by conductive atomic force microscope (cAFM) lithography, have established complex oxide interfaces as a promising platform for quantum engineering that harnesses emergent phenomena for advanced functionalities. However, this cAFM nanofabrication process can only occur in the air, with simultaneous device decay described under the "water-cycle" writing mechanism. These restrictions pose ongoing challenges for device optimization in the quantum regime at mK temperatures. Here, we demonstrate a "waterless" cAFM lithography approach that is compatible with vacuum and cryogenic environments. Through oxygen vacancy engineering at the LaAlO$_3$/SrTiO$_3$ interface, we have achieved nonvolatile and reconfigurable cAFM control of nanoscale interfacial polaron-electron liquid transition at mK temperatures with an ultrafine line resolution of 0.85 nm. Supported by first-principles calculations and drift-diffusion modeling, we show that tip-controlled oxygen vacancy electromigration plays a key role. This advancement bridges reconfigurable device fabrication and concurrent characterization in situ at mK temperatures, and establishes a versatile Hubbard toolbox for engineering programmable quantum phases in correlated oxides. |
| title | Reconfigurable Oxide Nanoelectronics by Tip-induced Electron Delocalization |
| topic | Mesoscale and Nanoscale Physics Materials Science Strongly Correlated Electrons |
| url | https://arxiv.org/abs/2601.07494 |