Mechanistic principles of exciton-polariton relaxation

Fuente: arXiv
Salvato in:
Dettagli Bibliografici
Autori principali: Haines, Ian, Manjalingal, Arshath, Blackham, Logan, Koshkaki, Saeed Rahamanian, Mandal, Arkajit
Natura: Preprint
Pubblicazione: 2026
Soggetti:
Accesso online:
Tags: Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne!!
_version_ 1866917397496070144
author Haines, Ian
Manjalingal, Arshath
Blackham, Logan
Koshkaki, Saeed Rahamanian
Mandal, Arkajit
author_facet Haines, Ian
Manjalingal, Arshath
Blackham, Logan
Koshkaki, Saeed Rahamanian
Mandal, Arkajit
contents Exciton-polaritons are light-matter hybrid quasi-particles that have emerged as a flexible platform for developing quantum technologies and engineering material properties. However, the fundamental mechanistic principles that govern their dynamics and relaxation remain elusive. In this work, we provide the microscopic mechanistic understanding of the exciton-polariton relaxation process that follows from an excitation in the upper polariton. Using both mixed quantum-classical simulations and analytical analysis, we reveal that phonon-induced upper-to-lower polariton relaxation proceeds via two steps: the first step is a vertical inter-band transition from the upper to the lower polariton, which is followed by a second step that is a phonon-induced Fröhlich scattering within the lower polariton. We find that in materials of finite thickness (which include filled cavities), phonon-induced polaritonic intraband Fröhlich scattering is significantly suppressed. We show that the microscopic origin of this suppression is phonon-fluctuations synchronization (or self-averaging) due to the polaritonic spatial delocalization in the quantization direction. Finally, we show that the same phonon fluctuation-synchronization effect plays a central role across polaritonic relaxation pathways, and we derive simple analytical expressions that relate a material's finite thickness to the corresponding relaxation rate constants.
format Preprint
id arxiv_https___arxiv_org_abs_2601_09068
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Mechanistic principles of exciton-polariton relaxation
Haines, Ian
Manjalingal, Arshath
Blackham, Logan
Koshkaki, Saeed Rahamanian
Mandal, Arkajit
Quantum Physics
Mesoscale and Nanoscale Physics
Materials Science
Exciton-polaritons are light-matter hybrid quasi-particles that have emerged as a flexible platform for developing quantum technologies and engineering material properties. However, the fundamental mechanistic principles that govern their dynamics and relaxation remain elusive. In this work, we provide the microscopic mechanistic understanding of the exciton-polariton relaxation process that follows from an excitation in the upper polariton. Using both mixed quantum-classical simulations and analytical analysis, we reveal that phonon-induced upper-to-lower polariton relaxation proceeds via two steps: the first step is a vertical inter-band transition from the upper to the lower polariton, which is followed by a second step that is a phonon-induced Fröhlich scattering within the lower polariton. We find that in materials of finite thickness (which include filled cavities), phonon-induced polaritonic intraband Fröhlich scattering is significantly suppressed. We show that the microscopic origin of this suppression is phonon-fluctuations synchronization (or self-averaging) due to the polaritonic spatial delocalization in the quantization direction. Finally, we show that the same phonon fluctuation-synchronization effect plays a central role across polaritonic relaxation pathways, and we derive simple analytical expressions that relate a material's finite thickness to the corresponding relaxation rate constants.
title Mechanistic principles of exciton-polariton relaxation
topic Quantum Physics
Mesoscale and Nanoscale Physics
Materials Science
url https://arxiv.org/abs/2601.09068