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Topology-Directed Silicide Formation: An Explanation for the Growth of C49-TiSi$_2$ on the Si(100) Surface

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Hückmann, Lukas, Cottom, Jonathon, Meyer, Jörg, Olsson, Emilia
Natura:	Preprint
Pubblicazione:	2026
Soggetti:	Materials Science
Accesso online:	Acceder al recurso
Tags:	Aggiungi Tag Nessun Tag, puoi essere il primo ad aggiungerne!!

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