A monolithic fabrication platform for intrinsically stretchable polymer transistors and complementary circuits

Fuente: arXiv
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Hauptverfasser: Yuan, Yujia, Zhao, Chuanzhen, Ronchini, Margherita, Nishio, Yuya, Zhong, Donglai, Wu, Can, Kweon, Hyukmin, Sun, Zehao, Mow, Rachael K., Shi, Yuran, Michalek, Lukas, Wu, Haotian, Liu, Qianhe, Wang, Weichen, Yao, Yating, Yin, Zelong, Zhao, Junyi, He, Zihan, Chen, Ke, Wu, Ruiheng, Shi, Jiuyun, Pei, Jian, Bao, Zhenan
Format: Preprint
Veröffentlicht: 2026
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author Yuan, Yujia
Zhao, Chuanzhen
Ronchini, Margherita
Nishio, Yuya
Zhong, Donglai
Wu, Can
Kweon, Hyukmin
Sun, Zehao
Mow, Rachael K.
Shi, Yuran
Michalek, Lukas
Wu, Haotian
Liu, Qianhe
Wang, Weichen
Yao, Yating
Yin, Zelong
Zhao, Junyi
He, Zihan
Chen, Ke
Wu, Ruiheng
Shi, Jiuyun
Pei, Jian
Bao, Zhenan
author_facet Yuan, Yujia
Zhao, Chuanzhen
Ronchini, Margherita
Nishio, Yuya
Zhong, Donglai
Wu, Can
Kweon, Hyukmin
Sun, Zehao
Mow, Rachael K.
Shi, Yuran
Michalek, Lukas
Wu, Haotian
Liu, Qianhe
Wang, Weichen
Yao, Yating
Yin, Zelong
Zhao, Junyi
He, Zihan
Chen, Ke
Wu, Ruiheng
Shi, Jiuyun
Pei, Jian
Bao, Zhenan
contents Soft, stretchable organic field-effect transistors (OFETs) can provide powerful on-skin signal conditioning, but current fabrication methods are often material-specific: each new polymer semiconductor (PSC) requires a tailored process. The challenge is even greater for complementary OFET circuits, where two PSCs must be patterned sequentially, which often leads to device degradation. Here, we introduce a universal, monolithic photolithography process that enables high-yield, high-resolution stretchable complementary OFETs and circuits. This approach is enabled by a process-design framework that includes (i) a direct, photopatternable, solvent-resistant, crosslinked dielectric/semiconductor interface, (ii) broadly applicable crosslinked PSC blends that preserve high mobility, and (iii) a patterning strategy that provides simultaneous etch masking and encapsulation. Using this platform, we achieve record integration density for stretchable OTFTs (55,000 cm^-2), channel lengths down to 2 um, and low-voltage operation at 5 V. We demonstrate photopatterning across multiple PSC types and realize complementary circuits, including 3 kHz stretchable ring oscillators, the first to exceed 1 kHz and representing more than a 60-fold increase in stage switching speed over the state of the art. Finally, we demonstrate the first stretchable complementary OTFT neuron circuit, where the output frequency is modulated by the input current to mimic neuronal signal processing. This scalable approach can be readily extended to diverse high-performance stretchable materials, accelerating the development and manufacturing of skin-like electronics.
format Preprint
id arxiv_https___arxiv_org_abs_2601_10975
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle A monolithic fabrication platform for intrinsically stretchable polymer transistors and complementary circuits
Yuan, Yujia
Zhao, Chuanzhen
Ronchini, Margherita
Nishio, Yuya
Zhong, Donglai
Wu, Can
Kweon, Hyukmin
Sun, Zehao
Mow, Rachael K.
Shi, Yuran
Michalek, Lukas
Wu, Haotian
Liu, Qianhe
Wang, Weichen
Yao, Yating
Yin, Zelong
Zhao, Junyi
He, Zihan
Chen, Ke
Wu, Ruiheng
Shi, Jiuyun
Pei, Jian
Bao, Zhenan
Systems and Control
Materials Science
Chemical Physics
Soft, stretchable organic field-effect transistors (OFETs) can provide powerful on-skin signal conditioning, but current fabrication methods are often material-specific: each new polymer semiconductor (PSC) requires a tailored process. The challenge is even greater for complementary OFET circuits, where two PSCs must be patterned sequentially, which often leads to device degradation. Here, we introduce a universal, monolithic photolithography process that enables high-yield, high-resolution stretchable complementary OFETs and circuits. This approach is enabled by a process-design framework that includes (i) a direct, photopatternable, solvent-resistant, crosslinked dielectric/semiconductor interface, (ii) broadly applicable crosslinked PSC blends that preserve high mobility, and (iii) a patterning strategy that provides simultaneous etch masking and encapsulation. Using this platform, we achieve record integration density for stretchable OTFTs (55,000 cm^-2), channel lengths down to 2 um, and low-voltage operation at 5 V. We demonstrate photopatterning across multiple PSC types and realize complementary circuits, including 3 kHz stretchable ring oscillators, the first to exceed 1 kHz and representing more than a 60-fold increase in stage switching speed over the state of the art. Finally, we demonstrate the first stretchable complementary OTFT neuron circuit, where the output frequency is modulated by the input current to mimic neuronal signal processing. This scalable approach can be readily extended to diverse high-performance stretchable materials, accelerating the development and manufacturing of skin-like electronics.
title A monolithic fabrication platform for intrinsically stretchable polymer transistors and complementary circuits
topic Systems and Control
Materials Science
Chemical Physics
url https://arxiv.org/abs/2601.10975