Thermally-Activated Epitaxy of NbO

Fuente: arXiv
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Autori principali: Glotzer, Sandra, Kim, Jeong Rae, Falson, Joseph
Natura: Preprint
Pubblicazione: 2026
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author Glotzer, Sandra
Kim, Jeong Rae
Falson, Joseph
author_facet Glotzer, Sandra
Kim, Jeong Rae
Falson, Joseph
contents We demonstrate a thermally-activated epitaxy window for the growth of NbO at temperatures exceeding 1000 $^o$C. NbO films grown in this mode display superior structural and transport properties, which are reproducible across a window of oxygen partial pressure. Through comprehensive analysis, we propose the prototypical electrical properties of NbO, for which a consensus has not yet been made. This study unequivocally demonstrates the utility of high temperatures in the thin film synthesis of refractory metal compounds.
format Preprint
id arxiv_https___arxiv_org_abs_2601_16313
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Thermally-Activated Epitaxy of NbO
Glotzer, Sandra
Kim, Jeong Rae
Falson, Joseph
Materials Science
Superconductivity
We demonstrate a thermally-activated epitaxy window for the growth of NbO at temperatures exceeding 1000 $^o$C. NbO films grown in this mode display superior structural and transport properties, which are reproducible across a window of oxygen partial pressure. Through comprehensive analysis, we propose the prototypical electrical properties of NbO, for which a consensus has not yet been made. This study unequivocally demonstrates the utility of high temperatures in the thin film synthesis of refractory metal compounds.
title Thermally-Activated Epitaxy of NbO
topic Materials Science
Superconductivity
url https://arxiv.org/abs/2601.16313