Impact of O concentration on the thermal stability and decomposition mechanism of (Cr,Al)N compared to (Ti,Al)N thin films

Documenti analoghi

• Contactless Tracking of Decomposition in Self‐Reporting Ceramic Cr‐Al‐B Coatings
  di: Peter J. Pöllmann, et al.
  Pubblicazione: (2025)
• Prediction and identification of point defect fingerprints in X-ray photoelectron spectra of TiN$_x$ with 1.18 $\le x \le$ 1.37
  di: Ondračka, Pavel, et al.
  Pubblicazione: (2024)
• Vacancy-concentration-dependent thermal stability of fcc-(Ti,Al)Nx predicted via chemical-environment-sensitive diffusion activation energies
  di: Nayak, Ganesh Kumar, et al.
  Pubblicazione: (2025)
• On the exceptional temperature stability of ferroelectric AlScN thin films
  di: Islam, MD Redwanul, et al.
  Pubblicazione: (2021)
• The effect of elastic-plastic mismatch and interface proximity on the fracture toughness of Ti-TiN thin films
  di: Mathews, Nidhin George, et al.
  Pubblicazione: (2025)