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| Auteurs principaux: | , , , , , |
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| Format: | Preprint |
| Publié: |
2026
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| Sujets: | |
| Accès en ligne: | https://arxiv.org/abs/2602.02637 |
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| _version_ | 1866917243858714624 |
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| author | Xu, Yuhao Chen, Miao Forestier, Louis Carcenac, Franck Mazenq, Laurent Lalanne, Philippe |
| author_facet | Xu, Yuhao Chen, Miao Forestier, Louis Carcenac, Franck Mazenq, Laurent Lalanne, Philippe |
| contents | Hyperuniform metasurfaces promise an unusual form of wave control: the suppression of elastic scattering over extended angular ranges without periodic order. Here, we present a comprehensive experimental and theoretical study of 2D stealthy hyperuniform metasurfaces operating at optical frequencies. In agreement with theoretical expectations, we observe a pronounced reduction of elastic scattering around the specular direction in metasurfaces fabricated by electron-beam lithography. However, the measured suppression is substantially weaker than that predicted by structure-factor calculations based on ideal stealthy hyperuniform point-pattern generators. We identify and quantitatively analyze the physical origins of this discrepancy, and establish realistic performance bounds. By isolating the dominant limiting mechanisms, our results provide practical design guidelines for the implementation of stealthy hyperuniform metasurfaces in functional photonic devices. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2602_02637 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Extrinsic Limitations of Stealthy Hyperuniform Optical Metasurfaces Xu, Yuhao Chen, Miao Forestier, Louis Carcenac, Franck Mazenq, Laurent Lalanne, Philippe Optics Hyperuniform metasurfaces promise an unusual form of wave control: the suppression of elastic scattering over extended angular ranges without periodic order. Here, we present a comprehensive experimental and theoretical study of 2D stealthy hyperuniform metasurfaces operating at optical frequencies. In agreement with theoretical expectations, we observe a pronounced reduction of elastic scattering around the specular direction in metasurfaces fabricated by electron-beam lithography. However, the measured suppression is substantially weaker than that predicted by structure-factor calculations based on ideal stealthy hyperuniform point-pattern generators. We identify and quantitatively analyze the physical origins of this discrepancy, and establish realistic performance bounds. By isolating the dominant limiting mechanisms, our results provide practical design guidelines for the implementation of stealthy hyperuniform metasurfaces in functional photonic devices. |
| title | Extrinsic Limitations of Stealthy Hyperuniform Optical Metasurfaces |
| topic | Optics |
| url | https://arxiv.org/abs/2602.02637 |