Artifact Removal and Image Restoration in AFM:A Structured Mask-Guided Directional Inpainting Approach

Fuente: arXiv

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Bibliographic Details
Main Authors:	Zhang, Juntao, Biswas, Angona, Rade, Jaydeep, Shukla, Charchit, Ren, Juan, Sarkar, Anwesha, Krishnamurthy, Adarsh, Balu, Aditya
Format:	Preprint
Published:	2026
Subjects:	Computer Vision and Pattern Recognition
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2602.04051