Questioning van der Waals Epitaxy of Non-Layered Materials on Mica: The Case of ScN

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Main Authors: Chowdhury, Susmita, Lahiji, Faezeh Alijan Farzad, Ottoson, Mikael, Donzel-Gargand, Olivier, Frost, Robert J. W., Magnuson, Martin, Ramanath, Ganpati, Febvrier, Arnaud le, Eklund, Per
Format: Preprint
Published: 2026
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author Chowdhury, Susmita
Lahiji, Faezeh Alijan Farzad
Ottoson, Mikael
Donzel-Gargand, Olivier
Frost, Robert J. W.
Magnuson, Martin
Ramanath, Ganpati
Febvrier, Arnaud le
Eklund, Per
author_facet Chowdhury, Susmita
Lahiji, Faezeh Alijan Farzad
Ottoson, Mikael
Donzel-Gargand, Olivier
Frost, Robert J. W.
Magnuson, Martin
Ramanath, Ganpati
Febvrier, Arnaud le
Eklund, Per
contents Growing stress-free epitaxial films by van der Waals epitaxy (vdWE) is of interest for realizing flexible optoelectronics and energy devices from freestanding epilayers. However, vdWE of non-layered materials is often presumed or claimed on layered substrates such as mica with inadequate experimental evidence. Here, we demonstrate that the growth of single-domain rocksalt ScN(111) films by sputter deposition on fluorophlogopite mica(001) occurs by conventional epitaxy. X-ray diffraction and electron microscopy reveal the film/substrate epitaxial relationship to be [-101](111)ScN||[010](001)mica. Our results indicating strain buildup seen from the dependence of (111) interplanar spacings, and strain relaxation by dislocation generation, question prior claims of vdWE of non-layered metal nitrides on mica. Our findings show that conventional epitaxy should be the default assumption for non-layered materials unless conditions for vdWE are explicitly established.
format Preprint
id arxiv_https___arxiv_org_abs_2602_05741
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Questioning van der Waals Epitaxy of Non-Layered Materials on Mica: The Case of ScN
Chowdhury, Susmita
Lahiji, Faezeh Alijan Farzad
Ottoson, Mikael
Donzel-Gargand, Olivier
Frost, Robert J. W.
Magnuson, Martin
Ramanath, Ganpati
Febvrier, Arnaud le
Eklund, Per
Materials Science
Growing stress-free epitaxial films by van der Waals epitaxy (vdWE) is of interest for realizing flexible optoelectronics and energy devices from freestanding epilayers. However, vdWE of non-layered materials is often presumed or claimed on layered substrates such as mica with inadequate experimental evidence. Here, we demonstrate that the growth of single-domain rocksalt ScN(111) films by sputter deposition on fluorophlogopite mica(001) occurs by conventional epitaxy. X-ray diffraction and electron microscopy reveal the film/substrate epitaxial relationship to be [-101](111)ScN||[010](001)mica. Our results indicating strain buildup seen from the dependence of (111) interplanar spacings, and strain relaxation by dislocation generation, question prior claims of vdWE of non-layered metal nitrides on mica. Our findings show that conventional epitaxy should be the default assumption for non-layered materials unless conditions for vdWE are explicitly established.
title Questioning van der Waals Epitaxy of Non-Layered Materials on Mica: The Case of ScN
topic Materials Science
url https://arxiv.org/abs/2602.05741