Burst-mode fs-laser direct writing for full-thickness oxidation of Ta thin films
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arXiv
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| Autori principali: | , , , , , , , |
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| Natura: | Preprint |
| Pubblicazione: |
2026
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| _version_ | 1866917254303580160 |
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| author | Grineviciute, Lina Huang, Hsin-Hui Mu, Haoran Le, Nguyen Hoai An Ang, Andrew Siao Ming Kapsaskis, Dan Katkus, Tomas Juodkazis, Saulius |
| author_facet | Grineviciute, Lina Huang, Hsin-Hui Mu, Haoran Le, Nguyen Hoai An Ang, Andrew Siao Ming Kapsaskis, Dan Katkus, Tomas Juodkazis, Saulius |
| contents | Direct fs-laser (1030~nm/200~fs) write of a throughout oxide Ta$_{2}$O$_{5}$ on a 200~nm Ta film was achieved using a combined ps- and ns- burst mode (Burst-in-Burst or BiB) of fs-pulse exposure at a high 0.6~MHz repetition rate. Few micrometers-wide lines were formed at the center of 12~$μ$m focal spot by controlled oxidation without ablation. The oxidized regions were flat and optically transparent. Wavelength-scale self-organized ripples of oxidized Ta$_{2}$O$_{5}$ sub-1~$μ$m gratings were recorded by rastering a $1\times 1$~mm$^2$ area. The oxidized ripples with periodic pattern $\sim wavelength$ were aligned with the polarization of the writing beam. Energy deposition in the burst-mode oxidation is discussed by comparing 200~fs and 20~ps BiB-mode writing modes. The presented strategy of self-guided oxidation with heat deposition by BiB fs-laser opens an opportunity for debris-free and annealing-free oxidation on a sub-wavelength scale. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2602_06444 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Burst-mode fs-laser direct writing for full-thickness oxidation of Ta thin films Grineviciute, Lina Huang, Hsin-Hui Mu, Haoran Le, Nguyen Hoai An Ang, Andrew Siao Ming Kapsaskis, Dan Katkus, Tomas Juodkazis, Saulius Optics Biological Physics Direct fs-laser (1030~nm/200~fs) write of a throughout oxide Ta$_{2}$O$_{5}$ on a 200~nm Ta film was achieved using a combined ps- and ns- burst mode (Burst-in-Burst or BiB) of fs-pulse exposure at a high 0.6~MHz repetition rate. Few micrometers-wide lines were formed at the center of 12~$μ$m focal spot by controlled oxidation without ablation. The oxidized regions were flat and optically transparent. Wavelength-scale self-organized ripples of oxidized Ta$_{2}$O$_{5}$ sub-1~$μ$m gratings were recorded by rastering a $1\times 1$~mm$^2$ area. The oxidized ripples with periodic pattern $\sim wavelength$ were aligned with the polarization of the writing beam. Energy deposition in the burst-mode oxidation is discussed by comparing 200~fs and 20~ps BiB-mode writing modes. The presented strategy of self-guided oxidation with heat deposition by BiB fs-laser opens an opportunity for debris-free and annealing-free oxidation on a sub-wavelength scale. |
| title | Burst-mode fs-laser direct writing for full-thickness oxidation of Ta thin films |
| topic | Optics Biological Physics |
| url | https://arxiv.org/abs/2602.06444 |