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Main Authors: Xia, Bing, Li, Xiaoyin, Chen, Hongyuan, Yang, Bo, Cai, Jie, Paolini, Stephen, Wang, Zihao, Yan, Zi-Jie, Yang, Hao, Liu, Xiaoxue, Liu, Liang, Guan, Dandan, Wang, Shiyong, Li, Yaoyi, Liu, Canhua, Zheng, Hao, Chang, Cui-Zu, Liu, Feng, Jia, Jinfeng
Format: Preprint
Published: 2026
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Online Access:https://arxiv.org/abs/2602.09361
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author Xia, Bing
Li, Xiaoyin
Chen, Hongyuan
Yang, Bo
Cai, Jie
Paolini, Stephen
Wang, Zihao
Yan, Zi-Jie
Yang, Hao
Liu, Xiaoxue
Liu, Liang
Guan, Dandan
Wang, Shiyong
Li, Yaoyi
Liu, Canhua
Zheng, Hao
Chang, Cui-Zu
Liu, Feng
Jia, Jinfeng
author_facet Xia, Bing
Li, Xiaoyin
Chen, Hongyuan
Yang, Bo
Cai, Jie
Paolini, Stephen
Wang, Zihao
Yan, Zi-Jie
Yang, Hao
Liu, Xiaoxue
Liu, Liang
Guan, Dandan
Wang, Shiyong
Li, Yaoyi
Liu, Canhua
Zheng, Hao
Chang, Cui-Zu
Liu, Feng
Jia, Jinfeng
contents The quantum size effect (QSE) and strain effect are two key factors influencing the surface morphology of thin films, which can increase film surface roughness through QSE-induced thickness oscillation and strain-induced island formation, respectively. Surface roughness usually manifests in the early stages of film growth and diminishes beyond a critical thickness. In this work, we employ molecular beam epitaxy (MBE) to grow Sn(100) islands with varying thickness N on bilayer graphene-terminated 6H-SiC(0001) substrates. Scanning tunneling microscopy and spectroscopy measurements reveal an inverse surface roughness effect that highlights the interplay of QSE and misfit strain in shaping the surface morphology of Sn(100) islands. For N =< 10, the islands exhibit flat surfaces, while for N >= 26, the island surfaces become corrugated and patterned. For the intermediate range, i.e., 12 =< N =<24, both flat and patterned surfaces coexist, with the percentage coverage of the patterned surface oscillating as a function of N. By performing density functional theory calculations, we demonstrate that the unusual surface pattern evolution in our MBE-grown Sn(100) islands is a result of the interplay between QSE-induced surface roughing and tensile strain-induced smoothening effect.
format Preprint
id arxiv_https___arxiv_org_abs_2602_09361
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Interplay of Quantum Size Effect and Tensile Strain on Surface Morphology of Sn(100) Islands
Xia, Bing
Li, Xiaoyin
Chen, Hongyuan
Yang, Bo
Cai, Jie
Paolini, Stephen
Wang, Zihao
Yan, Zi-Jie
Yang, Hao
Liu, Xiaoxue
Liu, Liang
Guan, Dandan
Wang, Shiyong
Li, Yaoyi
Liu, Canhua
Zheng, Hao
Chang, Cui-Zu
Liu, Feng
Jia, Jinfeng
Materials Science
Mesoscale and Nanoscale Physics
The quantum size effect (QSE) and strain effect are two key factors influencing the surface morphology of thin films, which can increase film surface roughness through QSE-induced thickness oscillation and strain-induced island formation, respectively. Surface roughness usually manifests in the early stages of film growth and diminishes beyond a critical thickness. In this work, we employ molecular beam epitaxy (MBE) to grow Sn(100) islands with varying thickness N on bilayer graphene-terminated 6H-SiC(0001) substrates. Scanning tunneling microscopy and spectroscopy measurements reveal an inverse surface roughness effect that highlights the interplay of QSE and misfit strain in shaping the surface morphology of Sn(100) islands. For N =< 10, the islands exhibit flat surfaces, while for N >= 26, the island surfaces become corrugated and patterned. For the intermediate range, i.e., 12 =< N =<24, both flat and patterned surfaces coexist, with the percentage coverage of the patterned surface oscillating as a function of N. By performing density functional theory calculations, we demonstrate that the unusual surface pattern evolution in our MBE-grown Sn(100) islands is a result of the interplay between QSE-induced surface roughing and tensile strain-induced smoothening effect.
title Interplay of Quantum Size Effect and Tensile Strain on Surface Morphology of Sn(100) Islands
topic Materials Science
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2602.09361