Aeschlimann, J., Durch, F., Weilenmann, C., Emboras, A., Luisier, M., & Leuthold, J. (2026). Multiscale Modeling of Metal/Oxide/Metal Conductive Bridging Random Access Memory Cells: From Ab Initio to Finite Element Calculations.
Chicago Style (17th ed.) CitationAeschlimann, Jan, Fabian Durch, Christoph Weilenmann, Alexandros Emboras, Mathieu Luisier, and Juerg Leuthold. Multiscale Modeling of Metal/Oxide/Metal Conductive Bridging Random Access Memory Cells: From Ab Initio to Finite Element Calculations. 2026.
MLA (9th ed.) CitationAeschlimann, Jan, et al. Multiscale Modeling of Metal/Oxide/Metal Conductive Bridging Random Access Memory Cells: From Ab Initio to Finite Element Calculations. 2026.
Warning: These citations may not always be 100% accurate.