Aeschlimann, J., Durch, F., Weilenmann, C., Emboras, A., Luisier, M., & Leuthold, J. (2026). Multiscale Modeling of Metal/Oxide/Metal Conductive Bridging Random Access Memory Cells: From Ab Initio to Finite Element Calculations.
Citazione stile Chigago Style (17a edizione)Aeschlimann, Jan, Fabian Durch, Christoph Weilenmann, Alexandros Emboras, Mathieu Luisier, e Juerg Leuthold. Multiscale Modeling of Metal/Oxide/Metal Conductive Bridging Random Access Memory Cells: From Ab Initio to Finite Element Calculations. 2026.
Citatione MLA (9a ed.)Aeschlimann, Jan, et al. Multiscale Modeling of Metal/Oxide/Metal Conductive Bridging Random Access Memory Cells: From Ab Initio to Finite Element Calculations. 2026.
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