Single-exposure holographic lithography of ultra-high aspect-ratio microstructures

Fuente: arXiv

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Bibliographic Details
Main Authors:	Lin, Dajun, Baker, Brian, Menon, Rajesh
Format:	Preprint
Published:	2026
Subjects:	Optics Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2602.11508