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Single-exposure holographic lithography of ultra-high aspect-ratio microstructures

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Lin, Dajun, Baker, Brian, Menon, Rajesh
Format:	Preprint
Publié:	2026
Sujets:	Optics Applied Physics
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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